发明授权
US06476399B1 System and method for removing contaminant particles relative to an ion beam
有权
相对于离子束去除污染物颗粒的系统和方法
- 专利标题： System and method for removing contaminant particles relative to an ion beam
- 专利标题（中）： 相对于离子束去除污染物颗粒的系统和方法
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申请号： US09654379申请日： 2000-09-01
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公开(公告)号： US06476399B1公开(公告)日： 2002-11-05
- 发明人: Eric R. Harrington , Victor M. Benveniste , Michael A. Graf , Robert D. Rathmell
- 申请人： Eric R. Harrington , Victor M. Benveniste , Michael A. Graf , Robert D. Rathmell
- 主分类号： H01J3730
- IPC分类号： H01J3730
摘要：
A system for inhibiting the transport of contaminant particles with an ion beam includes a particle charging system for charging particles within a region through which the ion beam travels. An electric field is generated downstream relative to the charged region so as to urge charged particles away from a direction of travel for the ion beam.