发明授权
US06502530B1 Design of gas injection for the electrode in a capacitively coupled RF plasma reactor
有权
电容耦合RF等离子体反应器中电极的气体注入设计
- 专利标题: Design of gas injection for the electrode in a capacitively coupled RF plasma reactor
- 专利标题(中): 电容耦合RF等离子体反应器中电极的气体注入设计
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申请号: US09559408申请日: 2000-04-26
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公开(公告)号: US06502530B1公开(公告)日: 2003-01-07
- 发明人: Emmanuel Turlot , Jean-Baptiste Chevrier , Jacques Schmitt , Jean Barreiro
- 申请人: Emmanuel Turlot , Jean-Baptiste Chevrier , Jacques Schmitt , Jean Barreiro
- 主分类号: C23C16509
- IPC分类号: C23C16509
摘要:
A plasma reactor has a reactor vessel and a pair of electrodes in the form of spaced apart and oppositely disposed metallic surfaces defining therebetween a plasma discharge space. At least one of the metallic surfaces is the surface of a metallic plate having a plurality of gas feed openings extending through the metallic surface towards said discharge space and from a distribution chamber extending along the plate opposite the discharge space. The distribution chamber has a wall opposite and distant from the plate and includes a gas inlet arrangement with a plurality of gas inlet openings distributed along the wall and connected to one or more gas feed lines to the reactor. A gas flow resistant coefficient between the one or more gas feed lines and at least a predominant portion of the connected inlet openings are at least substantially equal.
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