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1.发明授权公开(公告)号：US09045828B2
公开(公告)日：2015-06-02
申请号：US11877419
申请日：2007-10-23
IPC分类号： C23C16/507 , C23C16/509 , H01J1/00 , C23F1/00 , C23C16/455 , H01J37/32 , C23C16/06 , C23C16/22
CPC分类号： C23C16/5096 , C23C16/455 , C23C16/45561 , C23C16/45565 , C23C16/507 , C23C16/509 , H01J37/32082 , H01J37/3244 , H01J37/32623 , H01J37/32697
摘要： A plasma reactor has a reactor vessel and a pair of electrodes in the form of spaced apart and oppositely disposed metallic surfaces defining therebetween a plasma discharge space. At least one of the metallic surfaces is the surface of a metallic plate having a plurality of gas feed openings extending through the metallic surface towards said discharge space and from a distribution chamber extending along the plate opposite the discharge space. The distribution chamber has a wall opposite and distant from the plate and includes a gas inlet arrangement with a plurality of gas inlet openings distributed along the wall and connected to one or more gas feed lines to the reactor. A gas flow resistant coefficient between the one or more gas feed lines and at least a predominant portion of the connected inlet openings are at least substantially equal.
摘要翻译： 等离子体反应器具有反应器容器和一对间隔开且相对设置的金属表面形式的电极，在其间限定等离子体放电空间。 金属表面中的至少一个是金属板的表面，其具有多个气体供给开口，该多个气体供给开口延伸穿过金属表面朝向所述放电空间以及从沿着放电空间相对的板延伸的分配室。 分配室具有与板相对且远离的壁，并且包括气体入口装置，其具有沿着壁分布的多个气体入口开口，并连接到到反应器的一个或多个气体供给管线。 一个或多个气体供给管线与连接的入口开口的至少主要部分之间的气体流动阻力系数至少基本相等。
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2.发明授权Design of gas injection for the electrode in a capacitively coupled RF plasma reactor 有权电容耦合RF等离子体反应器中电极的气体注入设计公开(公告)号：US06502530B1
公开(公告)日：2003-01-07
申请号：US09559408
申请日：2000-04-26
IPC分类号： C23C16509
CPC分类号： C23C16/5096 , C23C16/455 , C23C16/45561 , C23C16/45565 , C23C16/507 , C23C16/509 , H01J37/32082 , H01J37/3244 , H01J37/32623 , H01J37/32697
摘要： A plasma reactor has a reactor vessel and a pair of electrodes in the form of spaced apart and oppositely disposed metallic surfaces defining therebetween a plasma discharge space. At least one of the metallic surfaces is the surface of a metallic plate having a plurality of gas feed openings extending through the metallic surface towards said discharge space and from a distribution chamber extending along the plate opposite the discharge space. The distribution chamber has a wall opposite and distant from the plate and includes a gas inlet arrangement with a plurality of gas inlet openings distributed along the wall and connected to one or more gas feed lines to the reactor. A gas flow resistant coefficient between the one or more gas feed lines and at least a predominant portion of the connected inlet openings are at least substantially equal.
摘要翻译： 等离子体反应器具有反应器容器和一对间隔开且相对设置的金属表面形式的电极，在其间限定等离子体放电空间。 金属表面中的至少一个是金属板的表面，其具有多个气体供给开口，该多个气体供给开口延伸穿过金属表面朝向所述放电空间以及从沿着放电空间相对的板延伸的分配室。 分配室具有与板相对且远离的壁，并且包括气体入口装置，其具有沿着壁分布的多个气体入口开口，并连接到到反应器的一个或多个气体供给管线。 一个或多个气体供给管线与连接的入口开口的至少主要部分之间的气体流动阻力系数至少基本相等。
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3.发明申请公开(公告)号：US20080093341A1
公开(公告)日：2008-04-24
申请号：US11877419
申请日：2007-10-23
IPC分类号： C23F1/00 , C23C16/509
CPC分类号： C23C16/5096 , C23C16/455 , C23C16/45561 , C23C16/45565 , C23C16/507 , C23C16/509 , H01J37/32082 , H01J37/3244 , H01J37/32623 , H01J37/32697
摘要： A plasma reactor has a reactor vessel and a pair of electrodes in the form of spaced apart and oppositely disposed metallic surfaces defining therebetween a plasma discharge space. At least one of the metallic surfaces is the surface of a metallic plate having a plurality of gas feed openings extending through the metallic surface towards said discharge space and from a distribution chamber extending along the plate opposite the discharge space. The distribution chamber has a wall opposite and distant from the plate and includes a gas inlet arrangement with a plurality of gas inlet openings distributed along the wall and connected to one or more gas feed lines to the reactor. A gas flow resistant coefficient between the one or more gas feed lines and at least a predominant portion of the connected inlet openings are at least substantially equal.
摘要翻译： 等离子体反应器具有反应器容器和一对间隔开且相对设置的金属表面形式的电极，在其间限定等离子体放电空间。 金属表面中的至少一个是金属板的表面，其具有多个气体供给开口，该多个气体供给开口延伸穿过金属表面朝向所述放电空间以及从沿着放电空间相对的板延伸的分配室。 分配室具有与板相对且远离的壁，并且包括气体入口装置，其具有沿着壁分布的多个气体入口开口，并连接到到反应器的一个或多个气体供给管线。 一个或多个气体供给管线与连接的入口开口的至少主要部分之间的气体流动阻力系数至少基本相等。
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4.发明授权公开(公告)号：US07306829B2
公开(公告)日：2007-12-11
申请号：US10300873
申请日：2002-11-21
IPC分类号： H05H1/24 , H01L21/306 , C23C16/00
CPC分类号： C23C16/5096 , C23C16/455 , C23C16/45561 , C23C16/45565 , C23C16/507 , C23C16/509 , H01J37/32082 , H01J37/3244 , H01J37/32623 , H01J37/32697
摘要： A plasma reactor has a reactor vessel and a pair of electrodes in the form of spaced apart and oppositely disposed metallic surfaces defining therebetween a plasma discharge space. At least one of the metallic surfaces is the surface of a metallic plate having a plurality of gas feed openings extending through the metallic surface towards said discharge space and from a distribution chamber extending along the plate opposite the discharge space. The distribution chamber has a wall opposite and distant from the plate and includes a gas inlet arrangement with a plurality of gas inlet openings distributed along the wall and connected to one or more gas feed lines to the reactor. A gas flow resistant coefficient between the one or more gas feed lines and at least a predominant portion of the connected inlet openings are at least substantially equal.
摘要翻译： 等离子体反应器具有反应器容器和一对间隔开且相对设置的金属表面形式的电极，在其间限定等离子体放电空间。 金属表面中的至少一个是金属板的表面，其具有多个气体供给开口，该多个气体供给开口延伸穿过金属表面朝向所述放电空间以及从沿着放电空间相对的板延伸的分配室。 分配室具有与板相对且远离的壁，并且包括气体入口装置，其具有沿着壁分布的多个气体入口开口，并连接到到反应器的一个或多个气体供给管线。 一个或多个气体供给管线与连接的入口开口的至少主要部分之间的气体流动阻力系数至少基本相等。
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5.发明申请Method for Fabricating an Image Sensor Device with Reduced Pixel Cross-Talk 审中-公开用于制造具有减少像素交叉对话的图像传感器装置的方法公开(公告)号：US20080210939A1
公开(公告)日：2008-09-04
申请号：US11883853
申请日：2006-02-22
IPC分类号： H01L31/0376 , H01L31/18
CPC分类号： H01L27/14689 , H01L27/1463 , H01L27/14634 , H01L27/14645
摘要： A method of fabricating an image sensor device (5) transferring an intensity of radiation (1) into an electrical current (i-i, a2) depending on said intensity, comprising the following steps in a vacuum deposition device: Depositing onto a dielectric, insulating surface a matrix of electrically conducting pads (7a, 7b) as rear electrical contacts, plasma assisted exposing said surface with pads to a donor delivering gas without adding a silicon containing gas, depositing a layer (15) of intrinsic silicon from a silicon delivering gas depositing a doped layer (17) and arranging an electrically conductive layer (19) transparent for said radiation (1) as a front contact. The method of fabricating an image-sensor-device and the image-sensor-device are avoiding disadvantages of the prior art. This means the image-sensor-device of the invention has a good ohmic contact, a low dark-current, no pixel-cross-talk and a reproducible fabrication-process.
摘要翻译： 一种制造根据所述强度将辐射强度（1）转移到电流（ii， 2）中的图像传感器装置的方法，包括以下步骤：真空沉积装置 ：作为后电接触将导电焊盘（7a，7b）的矩阵沉积到电介质绝缘表面上，等离子体辅助地将所述表面与焊盘接触，以向施主提供输送气体而不添加含硅气体，沉积层（15 ）沉积掺杂层（17）并且布置对于所述辐射（1）透明的导电层（19）作为前接触的硅输送气体的本征硅。 制造图像传感器装置和图像传感器装置的方法避免了现有技术的缺点。 这意味着本发明的图像传感器装置具有良好的欧姆接触，低暗电流，无像素串扰和可重现的制造工艺。
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公开(公告)号：US5623147A
公开(公告)日：1997-04-22
申请号：US560027
申请日：1995-11-17
CPC分类号： G01K17/003 , G01J5/40
摘要： A device for detecting infrared radiation which comprises a sensitive arm which, over at least a portion of its length, consists of bimetal. One end of said arm is joined to a membrane.
摘要翻译： 一种用于检测红外辐射的装置，其包括在其长度的至少一部分上由双金属构成的敏感臂。 所述臂的一端连接到膜。
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