RF plasma reactor having a distribution chamber with at least one grid
    1.
    发明授权
    RF plasma reactor having a distribution chamber with at least one grid 有权
    RF等离子体反应器具有至少一个栅格的分配室

    公开(公告)号:US09045828B2

    公开(公告)日:2015-06-02

    申请号:US11877419

    申请日:2007-10-23

    摘要: A plasma reactor has a reactor vessel and a pair of electrodes in the form of spaced apart and oppositely disposed metallic surfaces defining therebetween a plasma discharge space. At least one of the metallic surfaces is the surface of a metallic plate having a plurality of gas feed openings extending through the metallic surface towards said discharge space and from a distribution chamber extending along the plate opposite the discharge space. The distribution chamber has a wall opposite and distant from the plate and includes a gas inlet arrangement with a plurality of gas inlet openings distributed along the wall and connected to one or more gas feed lines to the reactor. A gas flow resistant coefficient between the one or more gas feed lines and at least a predominant portion of the connected inlet openings are at least substantially equal.

    摘要翻译: 等离子体反应器具有反应器容器和一对间隔开且相对设置的金属表面形式的电极,在其间限定等离子体放电空间。 金属表面中的至少一个是金属板的表面,其具有多个气体供给开口,该多个气体供给开口延伸穿过金属表面朝向所述放电空间以及从沿着放电空间相对的板延伸的分配室。 分配室具有与板相对且远离的壁,并且包括气体入口装置,其具有沿着壁分布的多个气体入口开口,并连接到到反应器的一个或多个气体供给管线。 一个或多个气体供给管线与连接的入口开口的至少主要部分之间的气体流动阻力系数至少基本相等。

    RF Plasma Reactor Having a Distribution Chamber with at Least One Grid
    2.
    发明申请
    RF Plasma Reactor Having a Distribution Chamber with at Least One Grid 有权
    RF等离子体反应器具有至少一个电网的分配室

    公开(公告)号:US20080093341A1

    公开(公告)日:2008-04-24

    申请号:US11877419

    申请日:2007-10-23

    IPC分类号: C23F1/00 C23C16/509

    摘要: A plasma reactor has a reactor vessel and a pair of electrodes in the form of spaced apart and oppositely disposed metallic surfaces defining therebetween a plasma discharge space. At least one of the metallic surfaces is the surface of a metallic plate having a plurality of gas feed openings extending through the metallic surface towards said discharge space and from a distribution chamber extending along the plate opposite the discharge space. The distribution chamber has a wall opposite and distant from the plate and includes a gas inlet arrangement with a plurality of gas inlet openings distributed along the wall and connected to one or more gas feed lines to the reactor. A gas flow resistant coefficient between the one or more gas feed lines and at least a predominant portion of the connected inlet openings are at least substantially equal.

    摘要翻译: 等离子体反应器具有反应器容器和一对间隔开且相对设置的金属表面形式的电极,在其间限定等离子体放电空间。 金属表面中的至少一个是金属板的表面,其具有多个气体供给开口,该多个气体供给开口延伸穿过金属表面朝向所述放电空间以及从沿着放电空间相对的板延伸的分配室。 分配室具有与板相对且远离的壁,并且包括气体入口装置,其具有沿着壁分布的多个气体入口开口,并连接到到反应器的一个或多个气体供给管线。 一个或多个气体供给管线与连接的入口开口的至少主要部分之间的气体流动阻力系数至少基本相等。

    RF plasma reactor having a distribution chamber with at least one grid
    3.
    发明授权
    RF plasma reactor having a distribution chamber with at least one grid 有权
    RF等离子体反应器具有至少一个栅格的分配室

    公开(公告)号:US07306829B2

    公开(公告)日:2007-12-11

    申请号:US10300873

    申请日:2002-11-21

    IPC分类号: H05H1/24 H01L21/306 C23C16/00

    摘要: A plasma reactor has a reactor vessel and a pair of electrodes in the form of spaced apart and oppositely disposed metallic surfaces defining therebetween a plasma discharge space. At least one of the metallic surfaces is the surface of a metallic plate having a plurality of gas feed openings extending through the metallic surface towards said discharge space and from a distribution chamber extending along the plate opposite the discharge space. The distribution chamber has a wall opposite and distant from the plate and includes a gas inlet arrangement with a plurality of gas inlet openings distributed along the wall and connected to one or more gas feed lines to the reactor. A gas flow resistant coefficient between the one or more gas feed lines and at least a predominant portion of the connected inlet openings are at least substantially equal.

    摘要翻译: 等离子体反应器具有反应器容器和一对间隔开且相对设置的金属表面形式的电极,在其间限定等离子体放电空间。 金属表面中的至少一个是金属板的表面,其具有多个气体供给开口,该多个气体供给开口延伸穿过金属表面朝向所述放电空间以及从沿着放电空间相对的板延伸的分配室。 分配室具有与板相对且远离的壁,并且包括气体入口装置,其具有沿着壁分布的多个气体入口开口,并连接到到反应器的一个或多个气体供给管线。 一个或多个气体供给管线与连接的入口开口的至少主要部分之间的气体流动阻力系数至少基本相等。

    Design of gas injection for the electrode in a capacitively coupled RF plasma reactor
    4.
    发明授权
    Design of gas injection for the electrode in a capacitively coupled RF plasma reactor 有权
    电容耦合RF等离子体反应器中电极的气体注入设计

    公开(公告)号:US06502530B1

    公开(公告)日:2003-01-07

    申请号:US09559408

    申请日:2000-04-26

    IPC分类号: C23C16509

    摘要: A plasma reactor has a reactor vessel and a pair of electrodes in the form of spaced apart and oppositely disposed metallic surfaces defining therebetween a plasma discharge space. At least one of the metallic surfaces is the surface of a metallic plate having a plurality of gas feed openings extending through the metallic surface towards said discharge space and from a distribution chamber extending along the plate opposite the discharge space. The distribution chamber has a wall opposite and distant from the plate and includes a gas inlet arrangement with a plurality of gas inlet openings distributed along the wall and connected to one or more gas feed lines to the reactor. A gas flow resistant coefficient between the one or more gas feed lines and at least a predominant portion of the connected inlet openings are at least substantially equal.

    摘要翻译: 等离子体反应器具有反应器容器和一对间隔开且相对设置的金属表面形式的电极,在其间限定等离子体放电空间。 金属表面中的至少一个是金属板的表面,其具有多个气体供给开口,该多个气体供给开口延伸穿过金属表面朝向所述放电空间以及从沿着放电空间相对的板延伸的分配室。 分配室具有与板相对且远离的壁,并且包括气体入口装置,其具有沿着壁分布的多个气体入口开口,并连接到到反应器的一个或多个气体供给管线。 一个或多个气体供给管线与连接的入口开口的至少主要部分之间的气体流动阻力系数至少基本相等。