发明授权
US06627475B1 Buried photodiode structure for CMOS image sensor 有权
用于CMOS图像传感器的掩埋光电二极管结构

Buried photodiode structure for CMOS image sensor
摘要:
A method of forming an image sensor is disclosed. A partially processed semiconductor wafer is provided, containing a p-type region. An n-type photodiode region is formed within the p-type region. A field oxide isolation region is then formed which extends beyond the p-type region and also covers the p-type region except for an active region and an overlap part of the n-type photodiode region. An n-channel MOSFET is fabricated in the active region with one of the source/drain regions of the MOSFET extending over the overlap part of the n-type photodiode region. A blanket transparent insulating layer is then deposited.
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