发明授权
- 专利标题： Foreign substance inspecting method and apparatus, which detect a height of a foreign substance, and an exposure apparatus using this inspecting apparatus
- 专利标题（中）： 检测异物的高度的异物检查方法和装置以及使用该检查装置的曝光装置
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申请号： US09822338申请日： 2001-04-02
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公开(公告)号： US06636303B2公开(公告)日： 2003-10-21
- 发明人: Hideki Ina , Koichi Sentoku , Takahiro Matsumoto
- 申请人： Hideki Ina , Koichi Sentoku , Takahiro Matsumoto
- 优先权： JP2000-103369 20000405
- 主分类号： G01N2100
- IPC分类号： G01N2100
摘要：
A foreign substance inspecting method includes the steps of detecting a height of a foreign substance attaching to a periphery of a wafer by irradiating a light beam from a light source to the wafer, thereby detecting the presence/absence of a foreign substance with not less than a predetermined height. The predetermined height is set to be substantially equal to a gap between the wafer and a mask at a wafer exposure.
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