Invention Grant
- Patent Title: Semiconductor device
- Patent Title (中): 半导体器件
-
Application No.: US10061365Application Date: 2002-02-04
-
Publication No.: US06642607B2Publication Date: 2003-11-04
- Inventor: Teruhito Ohnishi , Takeshi Takagi , Akira Asai , Taizo Fujii , Mitsuo Sugiura , Yoshihisa Minami
- Applicant: Teruhito Ohnishi , Takeshi Takagi , Akira Asai , Taizo Fujii , Mitsuo Sugiura , Yoshihisa Minami
- Priority: JP2001-027914 20010205
- Main IPC: H01L2993
- IPC: H01L2993

Abstract:
A variable capacitor includes an N+ layer including a variable capacitance region, a P+ layer epitaxially grown on the N+ layer and formed from a SiGe film and a Si film, and a P-type electrode. An NPN-HBT (Hetero-junction Bipolar Transistor) includes a collector diffusion layer formed simultaneously with the N+ layer of the variable capacitor, a collector layer, and a Si/SiGe layer epitaxially grown simultaneously with the P+ layer of the variable capacitor. Since a depletion layer formed in a PN junction of the variable capacitor can extend entirely across the N+ layer, reduction in variation range of the capacitance can be suppressed.
Public/Granted literature
- US20020135009A1 Semiconductor device and manufacturing method of the same Public/Granted day:2002-09-26
Information query