发明授权
- 专利标题: Semiconductor device
- 专利标题(中): 半导体器件
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申请号: US10061365申请日: 2002-02-04
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公开(公告)号: US06642607B2公开(公告)日: 2003-11-04
- 发明人: Teruhito Ohnishi , Takeshi Takagi , Akira Asai , Taizo Fujii , Mitsuo Sugiura , Yoshihisa Minami
- 申请人: Teruhito Ohnishi , Takeshi Takagi , Akira Asai , Taizo Fujii , Mitsuo Sugiura , Yoshihisa Minami
- 优先权: JP2001-027914 20010205
- 主分类号: H01L2993
- IPC分类号: H01L2993
摘要:
A variable capacitor includes an N+ layer including a variable capacitance region, a P+ layer epitaxially grown on the N+ layer and formed from a SiGe film and a Si film, and a P-type electrode. An NPN-HBT (Hetero-junction Bipolar Transistor) includes a collector diffusion layer formed simultaneously with the N+ layer of the variable capacitor, a collector layer, and a Si/SiGe layer epitaxially grown simultaneously with the P+ layer of the variable capacitor. Since a depletion layer formed in a PN junction of the variable capacitor can extend entirely across the N+ layer, reduction in variation range of the capacitance can be suppressed.
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