发明授权
- 专利标题： Photosensitive monomer, photosensitive polymer and chemically amplified resist composition comprising lactone group having acid-labile protecting group
- 专利标题（中）： 光敏单体，光敏聚合物和含有酸不稳定保护基的内酯基团的化学增幅抗蚀剂组合物
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申请号： US10077856申请日： 2002-02-20
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公开(公告)号： US06696217B2公开(公告)日： 2004-02-24
- 发明人: Kwang-sub Yoon , Sang-gyun Woo
- 申请人： Kwang-sub Yoon , Sang-gyun Woo
- 优先权： KR01-9001 20010222
- 主分类号： G03C173
- IPC分类号： G03C173
摘要：
A photosensitive monomer including a methylene butyrolactone derivative represented by the following formula: wherein R1 is a hydrogen atom or alkyl group, R2 is an acid-labile group, X is a hydrogen atom, or substituted or unsubstituted alkyl group having 1 to 10 carbon atoms, and Y is a substituted or unsubstitued alkyl group or alicyclic hydrocarbon group having 1 to 20 carbon atoms.
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