发明授权
- 专利标题: Copolymer, process for producing the same, and resist composition
- 专利标题(中): 共聚物,其制造方法和抗蚀剂组合物
-
申请号: US09646117申请日: 2000-09-27
-
公开(公告)号: US06706826B1公开(公告)日: 2004-03-16
- 发明人: Tadayuki Fujiwara , Masayuki Tooyama , Yukiya Wakisaka , Koji Nishida , Akira Yanagase
- 申请人: Tadayuki Fujiwara , Masayuki Tooyama , Yukiya Wakisaka , Koji Nishida , Akira Yanagase
- 优先权: JP10/82186 19980327; JP10/82187 19980327; JP10/82188 19980327; JP11/66615 19990312
- 主分类号: C08F200
- IPC分类号: C08F200
摘要:
The present invention relates to a copolymer for use in paints, resists, and the like; a method for manufacturing the same; and a resist composition using the same. The copolymer according to the present invention is obtained by means of polymerizing at least one monomer containing an alicyclic structure and one monomer containing a lactone structure, and the distribution of the copolymer composition of said monomer containing a lactone structure in said copolymer is in the range of −10 to +10 mol % of the average copolymer composition of said monomer containing a lactone structure in said entire copolymer. In addition, the copolymer according to the present invention is obtained by means of polymerizing a monomer containing an alicyclic structure, a monomer containing a lactone structure, and another vinyl monomer comprising a higher polarity than said monomer containing an alicyclic structure, but a lower polarity than said monomer containing a lactone structure. The copolymer according to the present invention exhibits superior adhesion properties to surfaces possessing a high polarity, such as metal surfaces and the like, in addition to excellent hydrophobic and thermal resistance properties, and also displays a favorable solubility in solvents used for paints, resists, and the like.
信息查询