公开(公告)号：US06706826B1

公开(公告)日：2004-03-16

申请号：US09646117

申请日：2000-09-27

申请人： Tadayuki Fujiwara ,  Masayuki Tooyama ,  Yukiya Wakisaka ,  Koji Nishida ,  Akira Yanagase

发明人： Tadayuki Fujiwara ,  Masayuki Tooyama ,  Yukiya Wakisaka ,  Koji Nishida ,  Akira Yanagase

IPC分类号： C08F200

CPC分类号： G03F7/039 ,  G03F7/0045

摘要： The present invention relates to a copolymer for use in paints, resists, and the like; a method for manufacturing the same; and a resist composition using the same. The copolymer according to the present invention is obtained by means of polymerizing at least one monomer containing an alicyclic structure and one monomer containing a lactone structure, and the distribution of the copolymer composition of said monomer containing a lactone structure in said copolymer is in the range of −10 to +10 mol % of the average copolymer composition of said monomer containing a lactone structure in said entire copolymer. In addition, the copolymer according to the present invention is obtained by means of polymerizing a monomer containing an alicyclic structure, a monomer containing a lactone structure, and another vinyl monomer comprising a higher polarity than said monomer containing an alicyclic structure, but a lower polarity than said monomer containing a lactone structure. The copolymer according to the present invention exhibits superior adhesion properties to surfaces possessing a high polarity, such as metal surfaces and the like, in addition to excellent hydrophobic and thermal resistance properties, and also displays a favorable solubility in solvents used for paints, resists, and the like.

摘要翻译： 本发明涉及一种用于涂料，抗蚀剂等的共聚物; 其制造方法; 和使用其的抗蚀剂组合物。 本发明的共聚物是通过聚合至少一种含有脂环结构的单体和含有内酯结构的单体而得到的，所述共聚物中含有内酯结构单体的共聚物组成的分布范围为 在所述全部共聚物中含有内酯结构的所述单体的平均共聚物组成为-10〜+ 10mol％。 此外，根据本发明的共聚物是通过使包含脂环结构的单体，含有内酯结构的单体和另外的含有比所述含有脂环结构的单体极性高的极性的乙烯基单体聚合而得到的， 比所述含有内酯结构的单体。 根据本发明的共聚物除了具有优异的疏水和耐热性能之外，还具有对具有高极性的表面，例如金属表面等的优异的粘合性，并且在用于涂料，抗蚀剂， 等等。

公开(公告)号：US06887646B1

公开(公告)日：2005-05-03

申请号：US10030430

申请日：2000-07-11

申请人： Tadayuki Fujiwara ,  Yukiya Wakisaka ,  Masayuki Tooyama

发明人： Tadayuki Fujiwara ,  Yukiya Wakisaka ,  Masayuki Tooyama

IPC分类号： G03F7/004 ,  G03F7/039

CPC分类号： G03F7/0045 ,  G03F7/039 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

摘要： The present invention discloses a chemically amplified resist composition comprising: a resin which becomes soluble in an aqueous alkali solution in the presence of an acid, a photo acid generator, and an amine derivative which shows, in water of 25° C., such a basicity as to form a conjugate acid and has a medium polarity. The amine derivative acts as a quencher. Therefore, the chemically amplified resist composition of the present invention enables formation of a very precise and fine resist pattern and can be suitably used particularly in a lithography using an ArF excimer laser beam.

摘要翻译： 本发明公开了一种化学放大抗蚀剂组合物，其包含：在酸存在下溶于碱水溶液的树脂，光酸产生剂和胺衍生物，其在25℃的水中显示出 碱性以形成共轭酸并具有中等极性。 胺衍生物用作猝灭剂。 因此，本发明的化学放大抗蚀剂组合物能够形成非常精确和精细的抗蚀剂图案，并且可以特别适用于使用ArF准分子激光束的光刻中。