- 专利标题: Laser apparatus, laser annealing method, and manufacturing method of a semiconductor device
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申请号: US09635422申请日: 2000-08-10
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公开(公告)号: US06730550B1公开(公告)日: 2004-05-04
- 发明人: Shunpei Yamazaki , Hisashi Ohtani , Koichiro Tanaka , Kenji Kasahara , Ritsuko Kawasaki
- 申请人: Shunpei Yamazaki , Hisashi Ohtani , Koichiro Tanaka , Kenji Kasahara , Ritsuko Kawasaki
- 优先权: JP11-229518 19990813; JP11-250940 19990903
- 主分类号: H01L2100
- IPC分类号: H01L2100
摘要:
To provide a laser apparatus and a laser annealing method with which a crystalline semiconductor film with a larger crystal grain size is obtained and which are low in their running cost. A solid state laser easy to maintenance and high in durability is used as a laser, and laser light emitted therefrom is linearized to increase the throughput and to reduce the production cost as a whole. Further, both the front side and the back side of an amorphous semiconductor film is irradiated with such laser light to obtain the crystalline semiconductor film with a larger crystal grain size.
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