Invention Grant
- Patent Title: Plated copper alloy material and process for production thereof
- Patent Title (中): 镀铜合金材料及其生产方法
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Application No.: US10207027Application Date: 2002-07-30
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Publication No.: US06759142B2Publication Date: 2004-07-06
- Inventor: Toshihisa Hara , Yasuhiro Shintani , Masayasu Nishimura , Ryoichi Ozaki , Masahiro Kawaguchi
- Applicant: Toshihisa Hara , Yasuhiro Shintani , Masayasu Nishimura , Ryoichi Ozaki , Masahiro Kawaguchi
- Priority: JP2001-232611 20010731; JP2002-020526 20020129
- Main IPC: B32B1520
- IPC: B32B1520

Abstract:
A plated copper alloy material for connecting terminals is provided which comprises a parent material of copper or copper alloy, a nickel layer and a copper-tin alloy layer. The nickel layer has a thickness of 0.1-1.0 &mgr;m. The copper-tin alloy layer has a thickness of 0.1-1.0 &mgr;m and contains 35-75 at % of copper. The material may additionally have a tin layer no thicker than 0.5 &mgr;m for an engaging type terminal containing 0.001-0.1 mass % of carbon, or thicker than 0.5 &mgr;m for a non-engaging type connector. The material meets requirements for capability of insertion with a small force, good electric reliability (due to low contact resistance) in a high-temperature atmosphere, workability for sharp bending without cracking, good solder wettability and good corrosion resistance to sulfur dioxide gas.
Public/Granted literature
- US20030129441A1 Plated copper alloy material and process for production thereof Public/Granted day:2003-07-10
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