Invention Grant
- Patent Title: Inline detection device for self-aligned contact defects
- Patent Title (中): 用于自对准接触缺陷的在线检测装置
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Application No.: US10061562Application Date: 2002-02-01
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Publication No.: US06774394B2Publication Date: 2004-08-10
- Inventor: Ting-Sing Wang
- Applicant: Ting-Sing Wang
- Priority: TW90120824A 20010824
- Main IPC: H01L2358
- IPC: H01L2358

Abstract:
The present invention provides an inline detection device for self-aligned contact defects, formed in a semiconductor substrate, comprising: an active area, formed in the semiconductor substrate, comprised of a serpentine gate having spacers on the side, a plurality of first contact windows nested immediately between the same spacers, a plurality of first contact plugs formed in the first contact windows, and two probing pads, formed in the semiconductor substrate, comprised of a plurality of matrix gates, a second contact window exposing portions of the matrix gates, and a second contact plug formed in the second contact window.
Public/Granted literature
- US20030040176A1 Inline detection device for self-aligned contact defects Public/Granted day:2003-02-27
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