Fluorine-containing photosensitive polymer having hydrate structure and resist composition comprising the same

Invention Grant

US06800418B2 Fluorine-containing photosensitive polymer having hydrate structure and resist composition comprising the same 失效

Title translation: 具有水合物结构的含氟光敏聚合物和包含其的抗蚀剂组合物

Please log in to see more content

Patent Title: Fluorine-containing photosensitive polymer having hydrate structure and resist composition comprising the same
Patent Title (中): 具有水合物结构的含氟光敏聚合物和包含其的抗蚀剂组合物
Application No.: US10264429

Application Date: 2002-10-04
Publication No.: US06800418B2

Publication Date: 2004-10-05
Inventor: Kwang-sub Yoon , Ki-yong Song , Sang-jun Choi , Sang-gyun Woo
Applicant: Kwang-sub Yoon , Ki-yong Song , Sang-jun Choi , Sang-gyun Woo
Priority: KR2001-81252 20011219
Main IPC: G03F7004
IPC: G03F7004

Fluorine-containing photosensitive polymer having hydrate structure and resist composition comprising the same

Abstract:

Provided are a fluorine-containing photosensitive polymer having a hydrate structure and a resist composition including the photosensitive polymer. The photosensitive polymer has an average molecular weight of about 3,000-100,000 with a repeating unit including a group having one of structural formulae below:

Abstract(Chinese):

提供具有水合物结构的含氟光敏聚合物和包含光敏聚合物的抗蚀剂组合物。光敏聚合物的平均分子量约为3,000-100,000，重复单元包括具有以下结构式之一的基团：

Public/Granted literature

US20030157430A1 Fluorine-containing photosensitive polymer having hydrate structure and resist composition comprising the same Public/Granted day:2003-08-21

Information query

Espacenet