- 专利标题: Method to fabricate high-performance NPN transistors in a BiCMOS process
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申请号: US10249821申请日: 2003-05-09
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公开(公告)号: US06809024B1公开(公告)日: 2004-10-26
- 发明人: James S. Dunn , Natalie B. Feilchenfeld , Qizhi Liu , Andreas D. Stricker
- 申请人: James S. Dunn , Natalie B. Feilchenfeld , Qizhi Liu , Andreas D. Stricker
- 主分类号: H01L2972
- IPC分类号: H01L2972
摘要:
A method of forming a quasi-self-aligned heterojunction bipolar transistor (HBT) that exhibits high-performance is provided. The method includes the use of a patterned emitter landing pad stack which serves to improve the alignment for the emitter-opening lithography and as an etch stop layer for the emitter opening etch. The present invention also provides an HBT that includes a raised extrinsic base having monocrystalline regions located beneath the emitter landing pad stack.
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