发明授权
- 专利标题： Compositions for removing etching residue and use thereof
- 专利标题（中）： 用于除去蚀刻残渣的组合物及其用途
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申请号： US10723737申请日： 2003-11-26
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公开(公告)号： US06821352B2公开(公告)日： 2004-11-23
- 发明人: Roberto John Rovito , David Barry Rennie , Dana L. Durham
- 申请人： Roberto John Rovito , David Barry Rennie , Dana L. Durham
- 主分类号： C23G102
- IPC分类号： C23G102
摘要：
A composition for removing etching residue and a method using same are disclosed herein. In one aspect, there is provided a method for removing etching residue from a substrate comprising: contacting the substrate with a composition comprising water, an organic dicarboxylic acid, a buffering agent, a fluorine source, and optionally a water miscible organic solvent.
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