发明授权
- 专利标题: Decoupling capacitors for thin gate oxides
- 专利标题(中): 薄栅氧化物去耦电容器
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申请号: US09469406申请日: 1999-12-22
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公开(公告)号: US06828638B2公开(公告)日: 2004-12-07
- 发明人: Ali Keshavarzi , Vivek K. De , Tanay Karnik , Rajendran Nair
- 申请人: Ali Keshavarzi , Vivek K. De , Tanay Karnik , Rajendran Nair
- 主分类号: H01L2976
- IPC分类号: H01L2976
摘要:
In some embodiments, the invention involves a die having a first conductor carrying a power supply voltage and a second conductor carrying a ground voltage. A semiconductor capacitor operating in depletion mode is coupled between the first and second conductors to provide decoupling capacitance between the first and second conductors, the semiconductor capacitor having a gate voltage. Various configurations may be used including: n+ gate poly and n+ source/drain regions in an n-body; p+ gate poly and n+ source/drain regions in an n-body; p+ gate poly and p+ source/drain regions in an n-body; p+ gate poly and p+ source/drain regions in a p-body; n+ gate poly and p+ source/drain regions in a p-body; n+ gate poly and n+ source/drain regions in a p-body. The power supply voltage may have a larger absolute value than does a flatband voltage.
公开/授权文献
- US20020140109A1 DECOUPLING CAPACITORS FOR THIN GATE OXIDES 公开/授权日:2002-10-03
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