- 专利标题： Atmospheric substrate processing apparatus for depositing multiple layers on a substrate
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申请号： US09938399申请日： 2001-08-23
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公开(公告)号： US06841006B2公开(公告)日： 2005-01-11
- 发明人: Michael Barnes , Michael S. Cox , Canfeng Lai , John Parks
- 申请人： Michael Barnes , Michael S. Cox , Canfeng Lai , John Parks
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 代理机构： Townsend & Townsend & Crew
- 主分类号： C23C16/54
- IPC分类号： C23C16/54 ; C30B25/08 ; H01L21/00 ; C23C16/00 ; B65G49/07 ; C23F1/00
摘要：
A substrate processing apparatus is disclosed. In one embodiment, the apparatus includes a first atmospheric deposition station and a second atmospheric deposition station. The second atmospheric deposition station comprises an atmospheric pressure vapor deposition chamber. A substrate handling system is adapted to transfer substrates between the first and the second atmospheric deposition stations.
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