Invention Grant
US06843882B2 Gas flow control in a wafer processing system having multiple chambers for performing same process
失效
在具有用于执行相同处理的多个室的晶片处理系统中的气体流量控制
- Patent Title: Gas flow control in a wafer processing system having multiple chambers for performing same process
- Patent Title (中): 在具有用于执行相同处理的多个室的晶片处理系统中的气体流量控制
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Application No.: US10263556Application Date: 2002-10-02
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Publication No.: US06843882B2Publication Date: 2005-01-18
- Inventor: Karthik Janakiraman , Victor Wang , Vikash Banthia , Teresa Winson , Nitin Ingle
- Applicant: Karthik Janakiraman , Victor Wang , Vikash Banthia , Teresa Winson , Nitin Ingle
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Townsend & Townsend & Crew
- Main IPC: C23C16/44
- IPC: C23C16/44 ; C23C16/455 ; C23C16/52 ; H01L21/00 ; H01L21/677 ; C23C16/00 ; C23F1/00 ; H01L21/306

Abstract:
A system for processing substrates comprises a plurality of process chambers. Each process chamber includes an inlet gas distribution member connected to an inlet gas line to distribute gas from the inlet gas line into the process chamber, and a gas outlet. The inlet gas distribution member has an inlet gas distribution member impedance to a gas flow through the inlet gas distribution member into the process chamber. The plurality of process chambers are substantially identical. A source gas delivery line is connected to the inlet gas lines of the plurality of process chambers to supply a gas flow to be divided into the inlet gas lines. A plurality of tunable upstream gas restrictors are each disposed in one of the inlet gas lines connected to the inlet gas distribution members of the process chambers and are configured to adjust a flow rate into the corresponding process chamber.
Public/Granted literature
- US20040007176A1 Gas flow control in a wafer processing system having multiple chambers for performing same process Public/Granted day:2004-01-15
Information query
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