发明授权
- 专利标题: Magnetic memory using perpendicular magnetization film
- 专利标题(中): 磁记忆采用垂直磁化膜
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申请号: US10255697申请日: 2002-09-27
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公开(公告)号: US06844605B2公开(公告)日: 2005-01-18
- 发明人: Naoki Nishimura
- 申请人: Naoki Nishimura
- 申请人地址: JP Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JP Tokyo
- 代理机构: Fitzpatrick, Cella, Harper & Scinto
- 优先权: JP2001-301771 20010928
- 主分类号: H01F10/32
- IPC分类号: H01F10/32 ; G11C11/16 ; H01F10/12 ; H01F10/16 ; H01L21/8246 ; H01L27/105 ; H01L43/08 ; H01L29/82
摘要:
In a magnetoresistive element of a magnetic memory, a inversion field Hc of at least a first magnetic layer is given by Hc = 2 ( Ku - 2 π Ms 2 f ) Ms where Ku and Ms are the perpendicular magnetic anisotropy constant and saturation magnetization of the first magnetic layer. The inversion field Hc is set smaller than a magnetic field generated by a magnetic field generation mechanism. Letting T be the film thickness of the first magnetic layer and W be the width and length, f is a factor given by f=7×10−13(T/W)4−2×10−9(T/W)3+3×10−6(T/W)2−0.0019(T/W)+0.9681 A magnetic memory manufacturing method is also disclosed.
公开/授权文献
- US20030081467A1 Magnetic memory using perpendicular magnetization film 公开/授权日:2003-05-01