发明授权
- 专利标题： Copolymers and photoresist compositions comprising same
- 专利标题（中）： 包含其的共聚物和光致抗蚀剂组合物
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申请号： US10408522申请日： 2003-04-07
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公开(公告)号： US06849381B2公开(公告)日： 2005-02-01
- 发明人: George G. Barclay , Stefan J. Caporale , Wang Yueh , Zhibiao Mao , Joseph Mattia
- 申请人： George G. Barclay , Stefan J. Caporale , Wang Yueh , Zhibiao Mao , Joseph Mattia
- 申请人地址： US MA Marlborough
- 专利权人： Shipley Company, L.L.C.
- 当前专利权人： Shipley Company, L.L.C.
- 当前专利权人地址： US MA Marlborough
- 代理机构： Edwards & Angell, LLP
- 代理商 Peter F. Corless; Darryl P. Frickey
- 主分类号： C08F220/18
- IPC分类号： C08F220/18 ; C08F222/06 ; C08F232/00 ; C08L33/06 ; C08L35/00 ; C08L45/00 ; G03F7/004 ; G03F7/039 ; H01L21/027
摘要：
The present invention includes polymers and photoresist compositions that comprise the polymers as a resin binder component. Photoresists of the invention include chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-200 nm, particularly 193 nm. Polymers of the invention suitably contain 1) photoacid labile groups that preferably contain an alicyclic moiety; 2) a polymerized electron-deficient monomer; 3) a polymerized cyclic olefin moiety. Particularly preferred polymers of the invention are tetrapolymers or pentapolymers, preferably with differing polymerized norbornene units.