Invention Grant
- Patent Title: Hole forming by cross-shape image exposure
- Patent Title (中): 通过十字形图像曝光形成的孔
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Application No.: US10065003Application Date: 2002-09-09
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Publication No.: US06861176B2Publication Date: 2005-03-01
- Inventor: Tsung-Hsien Wu , Ching-Yu Chang , Tahorng Yang
- Applicant: Tsung-Hsien Wu , Ching-Yu Chang , Tahorng Yang
- Applicant Address: TW Hsinchu
- Assignee: Macronix International Co., Ltd.
- Current Assignee: Macronix International Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Jianq Chyun IP Office
- Main IPC: G03C5/00
- IPC: G03C5/00 ; G03F1/00 ; G03F1/36 ; G03F9/00 ; H01L21/027 ; H01L21/302 ; H01L21/311 ; H01L21/461 ; H01L21/768
Abstract:
A method of forming holes in a layer through a cross-shape image exposure. The method includes removing a section from each corner of the rectangular patterns on a photomask to form cross-shape patterns so that circular or elliptical contact holes are formed on a photoresist layer after photo-exposure and development. Optical image contrast between contacts is increased by the cross-shape patterns on the photomask.
Public/Granted literature
- US20040048469A1 Hole forming by cross-shape image exposure Public/Granted day:2004-03-11
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