Invention Grant
- Patent Title: Multibeam generating apparatus and electron beam drawing apparatus
- Patent Title (中): 多光束发生装置和电子束描绘装置
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Application No.: US10618008Application Date: 2003-07-14
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Publication No.: US06870310B2Publication Date: 2005-03-22
- Inventor: Masahiko Okunuki , Hiroya Ohta , Norio Saito , Masaki Takakuwa , Sayaka Tanimoto , Takeshi Haraguchi
- Applicant: Masahiko Okunuki , Hiroya Ohta , Norio Saito , Masaki Takakuwa , Sayaka Tanimoto , Takeshi Haraguchi
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper and Scinto
- Priority: JP2002-207291 20020716
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H01J1/46 ; H01J3/02 ; H01J29/46 ; H01J37/06 ; H01J37/07 ; H01J37/09 ; H01J37/305 ; H01J37/317 ; H01L21/027
Abstract:
This invention provides a multielectron gun which generates a plurality of electron beams having uniform characteristics. A multielectron gun (2) is formed of a plurality of electron guns (2a-2c). The electron gun (2a) has, in addition to an electron source (21a), Wehnelt electrode (22a), and anode electrode (23), a shield electrode (24) between the Wehnelt electrode (22a) and anode electrode (23). The shield electrode reduces field interference among the electron guns.
Public/Granted literature
- US20040056578A1 Multibeam generating apparatus and electron beam drawing apparatus Public/Granted day:2004-03-25
Information query
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