发明授权
- 专利标题： Solid CO2 cleaning
- 专利标题（中）： 固体二氧化碳清洗
-
申请号： US10320836申请日： 2002-12-16
-
公开(公告)号： US06875286B2公开(公告)日： 2005-04-05
- 发明人: John M. Cotte , Catherine Ivers , Kenneth J. McCullough , Wayne M. Moreau , Robert J. Purtell , John P. Simons , William A. Syverson , Charles J. Taft
- 申请人： John M. Cotte , Catherine Ivers , Kenneth J. McCullough , Wayne M. Moreau , Robert J. Purtell , John P. Simons , William A. Syverson , Charles J. Taft
- 申请人地址： US NY Armonk
- 专利权人： International Business Machines Corporation
- 当前专利权人： International Business Machines Corporation
- 当前专利权人地址： US NY Armonk
- 代理机构： Delio & Peterson, LLC
- 代理商 John J. Tomaszewski; Lisa U. Jaklitsch
- 主分类号： H01L21/304
- IPC分类号： H01L21/304 ; B08B7/00 ; C25F1/00 ; H01L21/30 ; H01L21/302 ; H01L21/306
摘要：
A method and apparatus are provided for removing solid and/or liquid residues from electronic components such as semiconductor wafers utilizing liquid or supercritical carbon dioxide which is solidified on the surface of the wafer and then vaporized and removed from the system. In a preferred embodiment the solidification and vaporizing steps are repeated (cycled) before removal of the CO2 from the vessel. The residues are carried away with the vaporized carbon dioxide.
公开/授权文献
- US20040112406A1 Solid CO2 cleaning 公开/授权日：2004-06-17
信息查询
IPC分类:
