发明授权
- 专利标题： Cleaning agent and cleaning method
- 专利标题（中）： 清洁剂和清洁方法
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申请号： US09971589申请日： 2001-10-09
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公开(公告)号： US06875288B2公开(公告)日： 2005-04-05
- 发明人: Hideto Gotoh , Takayuki Niuya , Hiroyuki Mori , Hiroshi Matsunaga , Fukusaburo Ishihara , Yoshiya Kimura , Ryuji Sotoaka , Takuya Goto , Tetsuo Aoyama , Kojiro Abe
- 申请人： Hideto Gotoh , Takayuki Niuya , Hiroyuki Mori , Hiroshi Matsunaga , Fukusaburo Ishihara , Yoshiya Kimura , Ryuji Sotoaka , Takuya Goto , Tetsuo Aoyama , Kojiro Abe
- 申请人地址： JP Tokyo JP Tokyo
- 专利权人： Tokyo Electron Limited,Mitsubishi Gas Chemical Company, Inc.
- 当前专利权人： Tokyo Electron Limited,Mitsubishi Gas Chemical Company, Inc.
- 当前专利权人地址： JP Tokyo JP Tokyo
- 代理机构： Antonelli, Terry, Stout & Kraus, LLP
- 优先权： JP2000-309171 20001010
- 主分类号： B08B3/08
- IPC分类号： B08B3/08 ; B08B3/00 ; C11D1/00 ; C11D3/32 ; C11D3/34 ; C11D3/43 ; C11D11/00 ; C11D17/08 ; H01L21/02 ; H01L21/304 ; H01L21/311 ; H01L21/461
摘要：
The cleaning agent described above comprises a surfactant and an organic solvent, and the cleaning method described above is characterized by allowing the cleaning agent described above to flow on the surface of the material to be treated at a high speed to thereby clean the above surface. According to the present invention, deposits adhering firmly to a surface of a material to be treated can readily be removed without damaging the material to be treated.
公开/授权文献
- US20020064963A1 Cleaning agent and cleaning method 公开/授权日：2002-05-30