发明授权
- 专利标题： Lithographic apparatus and device manufacturing method
- 专利标题（中）： 平版印刷设备和器件制造方法
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申请号： US10305266申请日： 2002-11-27
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公开(公告)号： US06879377B2公开(公告)日： 2005-04-12
- 发明人: Hernes Jacobs , Piet Vosters , Sven Antoin Johan Hol , Harmen Klaas Van Der Schoot , Robert Johannes Petrus Van Diesen , David William Callan
- 申请人： Hernes Jacobs , Piet Vosters , Sven Antoin Johan Hol , Harmen Klaas Van Der Schoot , Robert Johannes Petrus Van Diesen , David William Callan
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop LLP
- 优先权： EP01204626 20011130
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; H01L21/027 ; G03B27/42 ; G03B27/58
摘要：
A lithographic projection apparatus includes a conduit that supplies utilities to a movable component in a vacuum chamber such as an object table, associated motor or sensor. The conduit comprises flexible metal bellows preventing out-gassing of the conduit due to the vacuum in the vacuum chamber while allowing movement of the movable component in at least a first degree of freedom.
公开/授权文献
- US20030137643A1 Lithographic apparatus and device manufacturing method 公开/授权日：2003-07-24
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