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1.发明授权Variable reluctance device, stage apparatus, lithographic apparatus and device manufacturing method 有权可变磁阻装置，平台装置，光刻装置和装置的制造方法公开(公告)号：US09081307B2
公开(公告)日：2015-07-14
申请号：US13156924
申请日：2011-06-09
申请人： Sven Antoin Johan Hol , Johannes Petrus Martinus Bernardus Vermeulen , Wilhelmus Henricus Theodorus Maria Aangenent , George Wilhelmus Johannes Clijsen , Johannes Antonius Gerardus Akkermans , Jacob Kornelis Ter Veer , Jeroen De Boeij
发明人： Sven Antoin Johan Hol , Johannes Petrus Martinus Bernardus Vermeulen , Wilhelmus Henricus Theodorus Maria Aangenent , George Wilhelmus Johannes Clijsen , Johannes Antonius Gerardus Akkermans , Jacob Kornelis Ter Veer , Jeroen De Boeij
IPC分类号： G03F7/20
CPC分类号： G03F7/70758 , G03F7/70775
摘要： A variable reluctance device includes first and second magnetic members, a coil, a measurement coil, and a control unit. The first and second magnetic members are displaceable relative to each other to provide a magnetic circuit having a variable reluctance. The coil for, in use, receiving a current for generating a magnetic flux through the magnetic circuit. The measurement coil for generating a measurement signal representative of the magnetic flux through the magnetic circuit, whereby the measurement coil is arranged to substantially enclose the magnetic flux through the magnetic circuit. The control unit arranged to receive the flux signal at an input terminal and, in response, provide a control signal based on the measurement signal at an output terminal for controlling an amplitude of the current or a force of a further device. The device can e.g., be applied in a stage apparatus or a lithographic apparatus.
摘要翻译： 可变磁阻装置包括第一和第二磁性部件，线圈，测量线圈和控制单元。 第一和第二磁性构件可相对于彼此移动以提供具有可变磁阻的磁路。 用于在使用中的线圈接收用于通过磁路产生磁通量的电流。 用于产生表示通过磁路的磁通的测量信号的测量线圈，由此测量线圈被布置成基本上包围通过磁路的磁通量。 所述控制单元被布置成在输入端子处接收通量信号，并且作为响应，基于输出端子处的测量信号提供控制信号，用于控制另一设备的电流或力的幅度。 该装置可以例如应用于平台装置或光刻设备中。
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2.发明申请LITHOGRAPHIC APPARATUS, METHOD OF DEFORMING A SUBSTRATE TABLE AND DEVICE MANUFACTURING METHOD 有权光刻装置，基板的变形方法及装置的制造方法公开(公告)号：US20120327386A1
公开(公告)日：2012-12-27
申请号：US13494638
申请日：2012-06-12
申请人： Yang-Shan Huang , Hans Butler , Jan Van Eijk , Sven Antoin Johan Hol , Engelbertus Antonius Fransiscus Van Der Pasch , Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Johannes Petrus Martinus Bernardus Vermeulen , Theodorus Petrus Maria Cadee , Robbert Edgar Van Leeuwen
发明人： Yang-Shan Huang , Hans Butler , Jan Van Eijk , Sven Antoin Johan Hol , Engelbertus Antonius Fransiscus Van Der Pasch , Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Johannes Petrus Martinus Bernardus Vermeulen , Theodorus Petrus Maria Cadee , Robbert Edgar Van Leeuwen
IPC分类号： G03B27/58
CPC分类号： G03F7/7085 , G03F7/70783
摘要： A lithographic apparatus includes a projection system, a substrate table, a plurality of sensors, an actuator and a controller. The projection system is configured to project a patterned beam of radiation onto a substrate. The substrate table is configured to support the substrate and to move relative to the projection system. The plurality of sensors is configured to measure a deformation of the substrate table. The actuator is configured to deform the substrate table. The controller is configured to control the actuator to deform the substrate table based on measurements made by the sensors. The plurality of sensors is located on a first side of the substrate table opposite to a second side of the substrate table facing the projection system. The plurality of sensors is substantially stationary relative to the projection system.
摘要翻译： 光刻设备包括投影系统，衬底台，多个传感器，致动器和控制器。 投影系统被配置为将图案化的辐射束投射到衬底上。 衬底台被配置为支撑衬底并相对于投影系统移动。 多个传感器被配置成测量衬底台的变形。 致动器构造成使基板台变形。 控制器被配置成基于由传感器进行的测量来控制致动器使基板台变形。 多个传感器位于与衬底台面对投影系统的第二侧相对的衬底台的第一侧上。 多个传感器相对于投影系统基本上是静止的。
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3.发明授权公开(公告)号：US07456935B2
公开(公告)日：2008-11-25
申请号：US11098608
申请日：2005-04-05
CPC分类号： G03F7/70791 , G03F7/70716 , G03F7/70758
摘要： A positioning device for positioning an object table includes a frame for supporting the object table in a first direction and a motor constructed and arranged to exert a first force on the object table in a second direction substantially perpendicular to the first direction and a second force on the object table in a third direction substantially perpendicular to the first direction and the second direction. A first part of the motor is constructed and arranged to co-operate with a second part for generating the first and second force. The first part is arranged on the object table, such that both the first force and the second force are directed substantially through the center of gravity of the object table.
摘要翻译： 用于定位物体台的定位装置包括：用于在第一方向上支撑物体台的框架;以及构造和布置成在基本上垂直于第一方向的第二方向上在第一方向上施加第一力并在第二方向施加第二力的电动机 所述物体台在大致垂直于所述第一方向和所述第二方向的第三方向上。 马达的第一部分被构造和布置成与第二部分配合以产生第一和第二力。 第一部分布置在物体台上，使得第一力和第二力都基本上指向物体台的重心。
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4.发明授权公开(公告)号：US07224429B2
公开(公告)日：2007-05-29
申请号：US10964818
申请日：2004-10-15
CPC分类号： H02N15/00 , G03F7/70758 , G03F7/70941 , H02K11/01 , H02K41/0352
摘要： A lithographic apparatus includes a positioning system including a first and second electromagnetic actuator. Each actuator includes two mutually co-operating electromagnetical elements which are movable with respect to one another due to force acting on the elements of the respective actuator. At least one of the actuators includes a shield configured to shield the actuator from a field generated by the other actuator. In this manner, a disturbance force due to the field is prevented to act on the shielded actuator. The invention also includes a positioning system including such actuators.
摘要翻译： 光刻设备包括一个包括第一和第二电磁致动器的定位系统。 每个致动器包括两个相互协调的电磁元件，它们由于作用在相应致动器的元件上的力而相对于彼此可移动。 致动器中的至少一个包括被配置为将致动器屏蔽到由另一致动器产生的场的屏蔽件。 以这种方式，防止由于场引起的干扰力作用在屏蔽的致动器上。 本发明还包括一种包括这种致动器的定位系统。
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5.发明授权Lithographic linear motor, lithographic apparatus, and device manufacturing method 有权光刻线性电机，光刻设备和器件制造方法公开(公告)号：US07095485B2
公开(公告)日：2006-08-22
申请号：US10797662
申请日：2004-03-11
CPC分类号： G03F7/70758 , H02K41/031 , H02K2201/18
摘要： A linear motor having a high driving force, high efficiency and low normal force comprises two opposed magnet tracks and an armature comprising three open coil sets. The linear motor may be used to drive a stage, such as, for example, a mask or wafer stage, in a lithographic apparatus.
摘要翻译： 具有高驱动力，高效率和低法向力的线性电动机包括两个相对的磁体轨道和包括三个开放线圈组的电枢。 线性电动机可以用于在光刻设备中驱动台，例如掩模或晶片台。
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6.发明授权Lithographic actuator mechanism, lithographic apparatus, and device manufacturing method 有权光刻致动器机构，光刻设备和器件制造方法公开(公告)号：US07088428B2
公开(公告)日：2006-08-08
申请号：US10797618
申请日：2004-03-11
CPC分类号： G03F7/70858 , G03F7/70758 , H02K9/22 , H02K41/0356
摘要： Lorentz actuators generate heat due to electrical dissipation in the field coils. As the field through the coils changes, eddy currents are induced in cooling elements leading to undesirable damping forces and heating. The present invention provides an improved design that reduces eddy currents by incorporating slits in the cooling element. Slits are preferably perpendicular to the induced electric field and parallel to each other, and reduce the magnitude of the eddy currents by forcing them to take paths of higher electrical resistance.
摘要翻译： 洛仑兹致动器由于场线圈中的电耗而产生热量。 当通过线圈的场变化时，在冷却元件中引起涡流，导致不期望的阻尼力和加热。 本发明提供了一种改进的设计，其通过在冷却元件中引入狭缝来减少涡流。 狭缝优选垂直于感应电场并且彼此平行，并且通过迫使它们采取更高电阻的路径来减小涡流的大小。
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7.发明授权Lithographic apparatus, method of deforming a substrate table and device manufacturing method 有权平版印刷装置，基板台的变形方法及装置的制造方法公开(公告)号：US09329501B2
公开(公告)日：2016-05-03
申请号：US13494638
申请日：2012-06-12
申请人： Yang-Shan Huang , Hans Butler , Jan Van Eijk , Sven Antoin Johan Hol , Engelbertus Antonius Fransiscus Van Der Pasch , Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Johannes Petrus Martinus Bernardus Vermeulen , Theodorus Petrus Maria Cadee , Robbert Edgar Van Leeuwen
发明人： Yang-Shan Huang , Hans Butler , Jan Van Eijk , Sven Antoin Johan Hol , Engelbertus Antonius Fransiscus Van Der Pasch , Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Johannes Petrus Martinus Bernardus Vermeulen , Theodorus Petrus Maria Cadee , Robbert Edgar Van Leeuwen
CPC分类号： G03F7/7085 , G03F7/70783
摘要： A lithographic apparatus includes a projection system, a substrate table, a plurality of sensors, an actuator and a controller. The projection system is configured to project a patterned beam of radiation onto a substrate. The substrate table is configured to support the substrate and to move relative to the projection system. The plurality of sensors is configured to measure a deformation of the substrate table. The actuator is configured to deform the substrate table. The controller is configured to control the actuator to deform the substrate table based on measurements made by the sensors. The plurality of sensors is located on a first side of the substrate table opposite to a second side of the substrate table facing the projection system. The plurality of sensors is substantially stationary relative to the projection system.
摘要翻译： 光刻设备包括投影系统，衬底台，多个传感器，致动器和控制器。 投影系统被配置为将图案化的辐射束投射到衬底上。 衬底台被配置为支撑衬底并相对于投影系统移动。 多个传感器被配置成测量衬底台的变形。 致动器构造成使基板台变形。 控制器被配置成基于由传感器进行的测量来控制致动器使基板台变形。 多个传感器位于与衬底台面对投影系统的第二侧相对的衬底台的第一侧上。 多个传感器相对于投影系统基本上是静止的。
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公开(公告)号：US20120249991A1
公开(公告)日：2012-10-04
申请号：US13428447
申请日：2012-03-23
CPC分类号： H02K41/033 , G03F7/70758
摘要： A motor includes a stator including a plurality of stator poles arranged in a repetitive arrangement with a first pitch, the stator poles facing a first side of a plane of movement, and a mover including a plurality of mover poles arranged in a repetitive arrangement with a second pitch, the mover poles facing a second, opposite side of the plane of movement. The poles of the stator and/or the mover are provided with a winding to alter a magnetic field in the respective ones of the stator poles and the mover poles in response to an electric current through the respective winding. At least one of the stator and the mover includes a permanent magnet for generating a magnetic field extending from the permanent magnet via at least one respective pole of the stator and the mover to the other one of the stator and the mover and back.
摘要翻译： 电动机包括：定子，其包括多个以第一节距重复布置的定子极，定子极面向运动平面的第一侧;以及动子，其包括以重复布置布置的多个移动极 第二节距，动子杆面向运动平面的第二个相对侧。 定子和/或动子的极设置有绕组，以响应于通过相应绕组的电流来改变相应的定子极和移动极中的磁场。 定子和动子中的至少一个包括用于产生从永磁体经由定子和移动器的至少一个相应磁极延伸到另一个定子和动子和后部的磁场的永磁体。
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公开(公告)号：US20120212723A1
公开(公告)日：2012-08-23
申请号：US13401560
申请日：2012-02-21
申请人： Sven Antoin Johan Hol , Jan Van Eijk , Johannes Petrus Martinus Bernardus Vermeulen , Gerard Johannes Pieter Nijsse , Simon Bernardus Cornelis Maria Martens , Yang-Shan Huang , Michael Wilhelmus Theodorus Koot , Jeroen De Boeij , Maarten Hartger Kimman , Wei Zhou
发明人： Sven Antoin Johan Hol , Jan Van Eijk , Johannes Petrus Martinus Bernardus Vermeulen , Gerard Johannes Pieter Nijsse , Simon Bernardus Cornelis Maria Martens , Yang-Shan Huang , Michael Wilhelmus Theodorus Koot , Jeroen De Boeij , Maarten Hartger Kimman , Wei Zhou
CPC分类号： H01F7/081 , G03F7/70758 , H01F7/122 , H01F7/1646
摘要： An electromagnetic actuator includes a first and second magnetic members that are displaceable relative to each other and are arranged to provide a magnetic circuit; and a coil configured to, in use, receive a current to generate a magnetic flux through the magnetic circuit, thereby generating a force between the first and second magnetic members in a first direction, the magnetic flux, in use, being transferred between the first and second magnetic members through a first surface of the first magnetic member and a second surface of the second magnetic member, the first and second surface being separated by an airgap, wherein the first surface and the second surface are arranged relative to each other such that an outer dimension of the first surface extends beyond an outer dimension of the second surface in a second direction substantially perpendicular to the first direction.
摘要翻译： 电磁致动器包括第一和第二磁性构件，其可相对于彼此移动并被布置成提供磁路; 以及线圈，其被配置为在使用中接收电流以产生通过所述磁路的磁通量，从而在第一方向上在所述第一和第二磁性构件之间产生力，所述磁通在使用中在所述第一 和第二磁性件通过第一磁性件的第一表面和第二磁性件的第二表面，第一和第二表面被气隙隔开，其中第一表面和第二表面相对于彼此布置使得 第一表面的外部尺寸在基本上垂直于第一方向的第二方向上延伸超过第二表面的外部尺寸。
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公开(公告)号：US07956982B2
公开(公告)日：2011-06-07
申请号：US11281901
申请日：2005-11-18
申请人： Sven Antoin Johan Hol , Angelo Cesar Peter De Klerk , Erik Roelof Loopstra , Fransicus Mathijs Jacobs , Mark Scholten
发明人： Sven Antoin Johan Hol , Angelo Cesar Peter De Klerk , Erik Roelof Loopstra , Fransicus Mathijs Jacobs , Mark Scholten
CPC分类号： G03F7/70875 , F28D11/02 , G03F7/70758 , H02K9/22 , H02N13/00
摘要： A cooling apparatus is described that has a first cooling structure, in thermal contact with a heat source having a temperature greater than a cool structure, including a channel through which a cooling fluid is passed, an isolator between the heat source and the cool structure, the isolator in thermal contact with the first cooling structure and including a material of low thermal conductivity, and a second cooling structure between the isolator and the cool structure, the second cooling structure including a channel through which cooling fluid is passed.
摘要翻译： 描述了一种具有第一冷却结构的冷却装置，其与具有大于冷结构的温度的热源热接触，该冷却结构包括冷却流体通过的通道，在热源和冷结构之间的隔离器， 所述隔离器与所述第一冷却结构热接触并且包括低热导率的材料，以及所述隔离器和所述冷结构之间的第二冷却结构，所述第二冷却结构包括冷却流体通过的通道。
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