发明授权
- 专利标题： Quartz glass body having improved resistance against plasma corrosion, and method for production thereof
- 专利标题（中）： 具有改善的耐等离子体腐蚀性的石英玻璃体及其制造方法
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申请号： US09935334申请日： 2001-08-22
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公开(公告)号： US06887576B2公开(公告)日： 2005-05-03
- 发明人: Tatsuhiro Sato , Nobumasa Yoshida , Akira Fujinoki , Kyoichi Inaki , Tomoyuki Shirai
- 申请人： Tatsuhiro Sato , Nobumasa Yoshida , Akira Fujinoki , Kyoichi Inaki , Tomoyuki Shirai
- 申请人地址： DE Hanau JP Tokyo
- 专利权人： Herseus Quarzglas GmbH & Co. KG,Shin-Etsu Quartz Products Co., Ltd.
- 当前专利权人： Herseus Quarzglas GmbH & Co. KG,Shin-Etsu Quartz Products Co., Ltd.
- 当前专利权人地址： DE Hanau JP Tokyo
- 代理机构： Tiajoloff & Kelly
- 优先权： JP2000-252993 20000823; JP2000-390823 20001222; JP2000-395988 20001226
- 主分类号： C03B19/01
- IPC分类号： C03B19/01 ; C03B19/06 ; C03B19/14 ; C03B32/00 ; C03C1/00 ; C03C3/06 ; C03C21/00 ; C03C23/00 ; C30B25/12 ; C30B31/14 ; B32B17/06 ; B32B9/00
摘要：
An object of the present invention is to provide a quartz glass body, especially a quartz glass jig for plasma reaction in producing semiconductors having excellent resistance against plasma corrosion, particularly, excellent corrosion resistance against F-based gaseous plasma; and a method for producing the same. A body made of quartz glass containing a metallic element and having an improved resistance against plasma corrosion is provided that contains bubbles and crystalline phase at an amount expressed by projected area of less than 100 mm2 per 100 cm3.
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