发明授权
- 专利标题： System for using a two part cover for protecting a reticle
- 专利标题（中）： 使用两部分盖子保护标线的系统
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申请号： US10369323申请日： 2003-02-20
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公开(公告)号： US06906783B2公开(公告)日： 2005-06-14
- 发明人: Santiago del Puerto , Erik R. Loopstra , Andrew Massar , Duane P. Kish , Abdullah Alikhan , Woodrow J. Olson , Jonathan H. Feroce
- 申请人： Santiago del Puerto , Erik R. Loopstra , Andrew Massar , Duane P. Kish , Abdullah Alikhan , Woodrow J. Olson , Jonathan H. Feroce
- 申请人地址： NL Veldhoven
- 专利权人： ASML Holding N.V.
- 当前专利权人： ASML Holding N.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Sterne, Kessler, Goldstein & Fox P.L.L.C.
- 主分类号： B65G49/07
- IPC分类号： B65G49/07 ; G03B27/42 ; G03B27/48 ; G03B27/58 ; G03F1/24 ; G03F1/62 ; G03F1/64 ; G03F1/66 ; G03F7/20 ; G03F9/00 ; H01L21/027
摘要：
A system and method are used to protect a mask from being contaminated by airborne particles. They include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.
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