发明授权
US06907596B2 Mask data generating apparatus, a computer implemented method for generating mask data and a computer program for controlling the mask data generating apparatus
失效
掩模数据产生装置，用于产生掩模数据的计算机实现方法和用于控制掩模数据产生装置的计算机程序
- 专利标题： Mask data generating apparatus, a computer implemented method for generating mask data and a computer program for controlling the mask data generating apparatus
- 专利标题（中）： 掩模数据产生装置，用于产生掩模数据的计算机实现方法和用于控制掩模数据产生装置的计算机程序
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申请号： US10385624申请日： 2003-03-12
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公开(公告)号： US06907596B2公开(公告)日： 2005-06-14
- 发明人: Sachiko Kobayashi , Toshiya Kotani , Satoshi Tanaka , Susumu Watanabe
- 申请人： Sachiko Kobayashi , Toshiya Kotani , Satoshi Tanaka , Susumu Watanabe
- 申请人地址： JP Tokyo
- 专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人地址： JP Tokyo
- 代理机构： Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- 优先权： JPP2002-090060 20020327
- 主分类号： G03F1/36
- IPC分类号： G03F1/36 ; G03F1/68 ; G03F1/70 ; H01L21/027 ; H01L21/82 ; G06F17/50
摘要：
A mask data generating apparatus comprising: a division module configured to extract a line segment and dividing the extracted line segment into a suitable length; a correction value calculation module configured to calculate correction value calculating points from each divided edge; a first calculated center point calculation module configured to set first calculated center points and a shape of a pattern; a first rectangular region preparation module configured to prepare first simulation regions and a plurality of first rectangular regions which overlap with each other; a second calculated center point calculation module configured to acquire second rectangular regions, and calculating second calculated center points based on the second rectangular regions; a second simulation region preparation module configured to acquire second simulation regions; a process simulation execution module configured to calculate a correction value; and a correction pattern preparation module configured to prepare the correction pattern.
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