发明授权
- 专利标题： Evaluation process of reactivity of silica glass with silicon melt and vibration at its surface, and silica glass crucible not causing the surface vibration
- 专利标题（中）： 石英玻璃与硅熔体的反应性评价过程及其表面振动，石英玻璃坩埚不会引起表面振动
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申请号： US10682112申请日： 2003-10-10
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公开(公告)号： US06911080B2公开(公告)日： 2005-06-28
- 发明人: Hiroshi Kishi , Minoru Kanda , Masanori Fukui
- 申请人： Hiroshi Kishi , Minoru Kanda , Masanori Fukui
- 申请人地址： JP Tokyo
- 专利权人： Japan Super Quartz Corporation
- 当前专利权人： Japan Super Quartz Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
- 优先权： JP2002-307214 20021022
- 主分类号： C03B20/00
- IPC分类号： C03B20/00 ; C30B15/10 ; C30B15/20 ; C30B15/22 ; C30B29/06 ; C30B35/00 ; G01N33/38
摘要：
A evaluation process of a vibration level at the surface of silicon melt held in a silica glass crucible is provided by setting in the vacuum furnace, the test piece of the silica glass cut out from a silica glass crucible, melting a little amount of silicon put on said piece of the glass, and measuring a vibration cycle of the silicon melt. Moreover, a silica glass crucible not causing the vibration at the surface of the silicon melt held in the silica glass crucible is also provided, wherein the vibration cycle of a silica glass of a side wall of the crucible is controlled at more than ⅙ seconds.