Invention Grant
US06932852B2 Method and apparatus for enhanced purification of high-purity metals
有权
用于增强高纯度金属纯化的方法和装置
- Patent Title: Method and apparatus for enhanced purification of high-purity metals
- Patent Title (中): 用于增强高纯度金属纯化的方法和装置
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Application No.: US10613545Application Date: 2003-07-02
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Publication No.: US06932852B2Publication Date: 2005-08-23
- Inventor: Kishio Tayama , Toshiaki Hodozuka
- Applicant: Kishio Tayama , Toshiaki Hodozuka
- Applicant Address: JP Tokyo
- Assignee: Dowa Mining Co., Ltd.
- Current Assignee: Dowa Mining Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Frishauf, Holtz, Goodman & Chick, P.C.
- Main IPC: C22B9/04
- IPC: C22B9/04 ; C22B17/06 ; C22B19/16 ; C22B58/00 ; C21C7/10

Abstract:
A 99.99% pure indium feed is charged into a crucible and heated to 1250 ° C. by an upper heater in a vacuum atmosphere at 1×10−4 Torr, whereupon indium evaporates, condenses on the inner surfaces of an inner tube and drips to be recovered into a liquid reservoir in the lower part of a tubular member, whereas impurity elements having a lower vapor pressure than indium stay within the crucible. The recovered indium mass in the liquid reservoir is heated to 1100° C. by a lower heater and the resulting vapors of impurity elements having a higher vapor pressure than indium pass through diffuser plates in an upper part of the tubular member to be discharged from the system, whereas the indium vapor recondenses upon contact with the diffuser plates and returns to the liquid reservoir, yielding 99.9999% pure indium, while preventing the loss of indium.
Public/Granted literature
- US20040083854A1 Method and apparatus for enhanced purification of high-purity metals Public/Granted day:2004-05-06
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