发明授权
- 专利标题: Gas circulating-processing apparatus
- 专利标题(中): 气体循环处理装置
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申请号: US10026566申请日: 2001-12-27
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公开(公告)号: US06938638B2公开(公告)日: 2005-09-06
- 发明人: Hiroshi Kubota , Rempei Nakata , Naruhiko Kaji , Itsuko Sakai , Takashi Yoda
- 申请人: Hiroshi Kubota , Rempei Nakata , Naruhiko Kaji , Itsuko Sakai , Takashi Yoda
- 申请人地址: JP Tokyo
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JP Tokyo
- 代理机构: Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- 优先权: JP2000-400833 20001228; JP2000-401179 20001228; JP2000-401180 20001228
- 主分类号: G05D7/03
- IPC分类号: G05D7/03 ; B08B5/00 ; B08B9/027 ; F17D1/04 ; H01L21/00
摘要:
A gas-circulating processing apparatus which comprises a processing chamber, a gas feeding piping, a gas supply piping, a first exhaust mechanism discharging a gas from the processing chamber, a second exhaust mechanism discharging a portion of a gas discharged from the first exhaust mechanism, a back pressure adjusting mechanism interposed between the first exhaust mechanism and the second exhaust mechanism to adjust a back pressure of the first exhaust mechanism, and a gas circulating piping which is configured to combine another portion of the gas that has been discharged from the first exhaust mechanism with a processing gas supplied from the gas supply piping, wherein the gas feeding piping has a larger inner diameter than that of the gas supply, or the processing gas is introduced into the first exhaust mechanism, or a first heater is provided to heat at least part of the circulating route.
公开/授权文献
- US20020134429A1 Gas circulating-processing apparatus 公开/授权日:2002-09-26