发明授权
- 专利标题： Color filter with resist material in scribe lines
- 专利标题（中）： 带有刻痕线的抗蚀剂材料的滤色片
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申请号： US10456759申请日： 2003-06-06
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公开(公告)号： US06956253B2公开(公告)日： 2005-10-18
- 发明人: Fu-Tien Weng , Yu-Kung Hsiao , Hung-Jen Hsu , Yi-Ming Dai , Chin-Chen Kuo , Te-Fu Tseng
- 申请人： Fu-Tien Weng , Yu-Kung Hsiao , Hung-Jen Hsu , Yi-Ming Dai , Chin-Chen Kuo , Te-Fu Tseng
- 申请人地址： TW Hsin-Chu
- 专利权人： Taiwan Semiconductor Manufacturing Co., Ltd.
- 当前专利权人： Taiwan Semiconductor Manufacturing Co., Ltd.
- 当前专利权人地址： TW Hsin-Chu
- 代理机构： Duane Morris LLP
- 代理商 Steven E. Koffs
- 主分类号： H01L21/46
- IPC分类号： H01L21/46 ; H01L21/78 ; H01L27/146 ; H01L29/768
摘要：
A color filter includes a substrate having a plurality of scribe lines arranged to form at least one filter region surrounded by the scribe lines. The scribe lines are at least partially filled with a resist material. At least one color resist layer is formed above the substrate within the at least one filter region.
公开/授权文献
- US20040248383A1 Method to reduce excess color filter signal deviation 公开/授权日：2004-12-09
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