发明授权
- 专利标题: Organosiloxanes
- 专利标题(中): 有机硅氧烷
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申请号: US10161561申请日: 2002-06-03
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公开(公告)号: US06962727B2公开(公告)日: 2005-11-08
- 发明人: William B. Bedwell , Nigel P. Hacker , Roger Y. Leung , Nancy Iwamoto , Jan Nedbal , Songyuan Xie , Lorenza Moro , Shyama P. Mukherjee
- 申请人: William B. Bedwell , Nigel P. Hacker , Roger Y. Leung , Nancy Iwamoto , Jan Nedbal , Songyuan Xie , Lorenza Moro , Shyama P. Mukherjee
- 申请人地址: US NJ Morristown
- 专利权人: Honeywell International Inc.
- 当前专利权人: Honeywell International Inc.
- 当前专利权人地址: US NJ Morristown
- 代理机构: Buchatter, Nemer et al.
- 代理商 Sandra P. Thompson
- 主分类号: C08G77/20
- IPC分类号: C08G77/20 ; C08G77/04 ; C08G77/12 ; C09D183/04 ; C09J183/04 ; G03F7/075 ; H01L21/312 ; H01L21/768 ; H01L23/522 ; H01L23/532 ; C23C16/56
摘要:
The present invention provides an organosiloxane comprising at least 80 weight percent of Formula 1: [Y0.01-1.0SiO1.5-2]a{Z0.01-1.0SiO1.5-2]b[H0.01-1.0SiO1.5-2]c (where Y is aryl; Z is alkenyl; a is from 15 percent to 70 percent of Formula 1; b is from 2 percent to 50 percent of Formula 1; and c is from 20 percent to 80 percent of Formula 1. The present organosiloxane may be used as ceramic binder, high temperature encapsulant, and fiber matrix binder. The present composition is also useful as an adhesion promoter in that it exhibits good adhesive properties when coupled with other materials in non-microelectronic or microelectronic applications. Preferably, the present compositions are used in microelectronic applications as etch stops, hardmasks, and dielectrics.
公开/授权文献
- US20030031789A1 Organosiloxanes 公开/授权日:2003-02-13
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