发明授权
- 专利标题： Circuit pattern inspection method and apparatus
- 专利标题（中）： 电路图形检查方法和装置
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申请号： US09802693申请日： 2001-03-08
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公开(公告)号： US06975754B2公开(公告)日： 2005-12-13
- 发明人: Takashi Hiroi , Masahiro Watanabe , Chie Shishido , Asahiro Kuni , Maki Tanaka , Hiroshi Miyai , Yasuhiko Nara , Mari Nozoe
- 申请人： Takashi Hiroi , Masahiro Watanabe , Chie Shishido , Asahiro Kuni , Maki Tanaka , Hiroshi Miyai , Yasuhiko Nara , Mari Nozoe
- 申请人地址： JP Tokyo
- 专利权人： Hitachi, Ltd.
- 当前专利权人： Hitachi, Ltd.
- 当前专利权人地址： JP Tokyo
- 代理机构： Townsend and Townsend and Crew LLP
- 主分类号： G01N21/956
- IPC分类号： G01N21/956 ; G06T7/00 ; G06K9/00
摘要：
The present invention provides techniques, including a method and system, for inspecting for defects in a circuit pattern on a semi-conductor material. One specific embodiment provides a trial inspection threshold setup method, where the initial threshold is modified after a defect analysis of trial inspection stored data. The modified threshold is then used as the threshold in actual inspection.
公开/授权文献
- US20020051565A1 Circuit pattern inspection method and apparatus 公开/授权日：2002-05-02
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