METHOD AND ITS APPARATUS FOR INSPECTING A PATTERN
    10.
    发明申请
    METHOD AND ITS APPARATUS FOR INSPECTING A PATTERN 审中-公开
    用于检查图案的方法及其装置

    公开(公告)号:US20080002876A1

    公开(公告)日:2008-01-03

    申请号:US11853500

    申请日:2007-09-11

    IPC分类号: G06K9/00

    CPC分类号: G06T7/001 G06T2207/30148

    摘要: In a pattern inspecting apparatus, images of places which can be expected to be the same pattern are compared with one another. However, a comparison of images obtained by different stage scans and the occurrence of a place capable of being inspected only once lead to a deterioration in the performance of detecting various error defects and an area incapable of being inspected, respectively. For solving this problem, defects detected in a high sensitivity condition are regarded as defect candidates and a critical threshold value, used as a boundary to detect a smaller value as a defect, of a defect candidate portion is obtained by an image processing circuit or an image of the defect candidate portion is obtained by processing with software. Further, the critical threshold value thus obtained is compared with plural threshold values, thereby permitting plural inspection results to be obtained in a single inspection.

    摘要翻译: 在图案检查装置中,将可以预期相同图案的位置的图像彼此进行比较。 然而,通过不同阶段扫描获得的图像和仅能够被检查的位置的发生的比较分别导致检测各种错误缺陷的性能和不能被检查的区域的劣化。 为了解决这个问题,在高灵敏度条件下检测到的缺陷被认为是缺陷候选,并且通过图像处理电路或图像处理电路获得用作检测缺陷候选部分的较小值作为缺陷的边界的临界阈值 通过软件处理获得缺陷候选部分的图像。 此外,将如此获得的临界阈值与多个阈值进行比较,从而允许在单次检查中获得多个检查结果。