发明授权
- 专利标题: Method for making a microelectronic interposer
- 专利标题(中): 制造微电子插入器的方法
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申请号: US10658941申请日: 2003-09-10
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公开(公告)号: US06978538B2公开(公告)日: 2005-12-27
- 发明人: Thomas H. DiStefano , Joseph Fjelstad
- 申请人: Thomas H. DiStefano , Joseph Fjelstad
- 申请人地址: US CA San Jose
- 专利权人: Tessera, Inc.
- 当前专利权人: Tessera, Inc.
- 当前专利权人地址: US CA San Jose
- 代理机构: Lerner, David, Littenberg, Krumholz & Mentlik, LLP
- 主分类号: H01L23/498
- IPC分类号: H01L23/498 ; H01L23/538 ; H01R12/51 ; H05K1/03 ; H05K1/11 ; H05K3/46 ; H05K3/36
摘要:
A microelectronic interposer is made by providing a sacrificial layer over the surface of a planar body. Apertures are formed passing through the body and the sacrificial layer. A layer of an electrically conductive structural material is deposited in each of the apertures and over the sacrificial layer, proximate to each aperture to thereby form contacts. The sacrificial layer is removed leaving the contacts with outwardly flaring peripheral portions spaced vertically above the surface of the planar body.
公开/授权文献
- US20040045159A1 Electrical connection with inwardly deformable contacts 公开/授权日:2004-03-11
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