Invention Grant
US06984482B2 Top-coating composition for photoresist and process for forming fine pattern using the same
失效
用于光致抗蚀剂的顶涂组合物和使用其形成精细图案的方法
- Patent Title: Top-coating composition for photoresist and process for forming fine pattern using the same
- Patent Title (中): 用于光致抗蚀剂的顶涂组合物和使用其形成精细图案的方法
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Application No.: US10174497Application Date: 2002-06-17
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Publication No.: US06984482B2Publication Date: 2006-01-10
- Inventor: Jae Chang Jung , Keun Kyu Kong , Hyeong Soo Kim , Jin Soo Kim , Cha Won Koh , Sung Eun Hong , Geun Su Lee , Min Ho Jung , Ki Ho Baik
- Applicant: Jae Chang Jung , Keun Kyu Kong , Hyeong Soo Kim , Jin Soo Kim , Cha Won Koh , Sung Eun Hong , Geun Su Lee , Min Ho Jung , Ki Ho Baik
- Applicant Address: KR
- Assignee: Hynix Semiconductor Inc.
- Current Assignee: Hynix Semiconductor Inc.
- Current Assignee Address: KR
- Agency: Townsend and Townsend and Crew LLP
- Priority: KR99-20538 19990603
- Main IPC: G03F7/11
- IPC: G03F7/11 ; G03F7/09 ; G03F7/00
Abstract:
The present invention provides an over-coating composition comprising a basic compound for coating a photoresist composition to provide a vertical photoresist pattern.
Public/Granted literature
- US20030108815A1 Top-coating composition for photoresist and process for forming fine pattern using the same Public/Granted day:2003-06-12
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