发明授权
US06987035B2 Method and apparatus for forming crystallized semiconductor layer, and method for manufacturing semiconductor apparatus 失效
用于形成结晶半导体层的方法和装置,以及半导体装置的制造方法

Method and apparatus for forming crystallized semiconductor layer, and method for manufacturing semiconductor apparatus
摘要:
A method for forming a crystallized semiconductor layer includes preparing a non-single-crystal semiconductor layer in which at least one crystal seed is formed, and irradiating with an energy ray the non-single-crystal semiconductor layer having the crystal seed formed therein to allow a crystal to laterally grow from the crystal seed in the non-single-crystal semiconductor layer, irradiation of the energy ray is carried out by positioning to at least a part of the crystal seed an area having a minimum intensity value of the energy ray, the energy ray having a confirmation that an area having a maximum intensity value of the energy ray is continuously reduced to the area having the minimum intensity value in an irradiated surface.
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