Invention Grant
US07000207B2 Method of using a Manhattan layout to realize non-Manhattan shaped optical structures 有权
使用曼哈顿布局实现非曼哈顿形光学结构的方法

Method of using a Manhattan layout to realize non-Manhattan shaped optical structures
Abstract:
A system and method for providing the layout of non-Manhattan shaped integrated circuit elements using a Manhattan layout system utilizes a plurality of minimal sized polygons (e.g., rectangles) to fit within the boundaries of the non-Manhattan element. The rectangles are fit such that at least one vertex of each rectangle coincides with a grid point on the Manhattan layout system. Preferably, the rectangles are defined by using the spacing being adjacent grid points as the height of each rectangle. As the distance between adjacent grid points decreases, the layout better matches the actual shape of the non-Manhattan element. The system and method then allows for electrical and optical circuit elements to be laid out simultaneously, using the same layout software and equipment.
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