发明授权
- 专利标题: Method for fabricating array substrate of liquid crystal display device
- 专利标题(中): 制造液晶显示装置阵列基板的方法
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申请号: US10875318申请日: 2004-06-25
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公开(公告)号: US07001796B2公开(公告)日: 2006-02-21
- 发明人: Heung Lyul Cho , Seung Hee Nam , Jae Young Oh
- 申请人: Heung Lyul Cho , Seung Hee Nam , Jae Young Oh
- 申请人地址: KR Seoul
- 专利权人: LG.Philips LCD Co., Ltd.
- 当前专利权人: LG.Philips LCD Co., Ltd.
- 当前专利权人地址: KR Seoul
- 代理机构: McKenna Long & Aldridge LLP
- 优先权: KR10-2003-0075508 20031028
- 主分类号: H01C21/00
- IPC分类号: H01C21/00
摘要:
An array substrate of a liquid crystal display (LCD) device and a method for fabricating the same is disclosed, to decrease the unit cost and time of fabrication by decreasing the usage count of mask, which includes simultaneously forming a gate line, a gate electrode and a pixel electrode on a substrate; depositing a gate insulating layer and an active layer on an entire surface of the substrate including the gate line; patterning the gate insulating layer and the active layer to remain on the gate line and the gate electrode; selectively removing the active layer above the gate line; forming a data line perpendicular to the gate line and source/drain electrodes; and depositing a passivation layer on the entire surface of the substrate including the data line.
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