发明授权
- 专利标题: Method for making memory cell without halo implant
- 专利标题(中): 制造无光晕植入记忆细胞的方法
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申请号: US10750566申请日: 2003-12-31
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公开(公告)号: US07001811B2公开(公告)日: 2006-02-21
- 发明人: Ali Keshavarzi , Stephen H. Tang , Dinesh Somasekhar , Fabrice Paillet , Muhammad M. Khellah , Yibin Ye , Shih-Lien L. Lu , Vivek K. De
- 申请人: Ali Keshavarzi , Stephen H. Tang , Dinesh Somasekhar , Fabrice Paillet , Muhammad M. Khellah , Yibin Ye , Shih-Lien L. Lu , Vivek K. De
- 申请人地址: US CA Santa Clara
- 专利权人: Intel Corporation
- 当前专利权人: Intel Corporation
- 当前专利权人地址: US CA Santa Clara
- 代理机构: Buckley, Maschoff & Talwalker LLC
- 主分类号: H01L21/336
- IPC分类号: H01L21/336
摘要:
Some embodiments provide a memory cell comprising a body region doped with charge carriers of a first type, a source region disposed in the body region and doped with charge carriers of a second type, and a drain region disposed in the body region and doped with charge carriers of the second type. According to some embodiments, the body region, the source region, and the drain region are oriented in a first direction, the body region and the source region form a first junction, and the body region and the drain region form a second junction. Moreover, a conductivity of the first junction from the body region to the source region in a case that the first junction is unbiased is substantially less than a conductivity of the second junction from the body region to the drain region in a case that the second junction is unbiased. Some embodiments further include a transistor oriented in a second direction, wherein the second direction is not parallel to the first direction.
公开/授权文献
- US20050145935A1 Memory cell without halo implant 公开/授权日:2005-07-07
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