发明授权
- 专利标题: Thin specimen producing method and apparatus
- 专利标题(中): 薄标本制造方法和装置
-
申请号: US10854868申请日: 2004-05-27
-
公开(公告)号: US07002150B2公开(公告)日: 2006-02-21
- 发明人: Kouji Iwasaki , Yutaka Ikku
- 申请人: Kouji Iwasaki , Yutaka Ikku
- 申请人地址: JP Chiba
- 专利权人: SII NanoTechnology Inc.
- 当前专利权人: SII NanoTechnology Inc.
- 当前专利权人地址: JP Chiba
- 代理机构: Adams & Wilks
- 主分类号: G21K7/00
- IPC分类号: G21K7/00
摘要:
A thin specimen producing method acquires a work amount in a 1-line scan by an FIB under a predetermined condition, measures a remaining work width of a thin film on an upper surface of a specimen by a microscopic length-measuring function, determines a required number of scan lines of work to reach a predetermined width by calculation, and executes a work to obtain a set thickness. The work amount in a one-line scan by the FIB under the predetermined condition is determined by working the specimen in scans of plural lines, measuring the etched dimension by the microscopic length-measuring function, and calculating an average work amount per one-line scan.
公开/授权文献
- US20040245464A1 Thin specimen producing method and apparatus 公开/授权日:2004-12-09