公开(公告)号：US07002150B2

公开(公告)日：2006-02-21

申请号：US10854868

申请日：2004-05-27

申请人： Kouji Iwasaki ,  Yutaka Ikku

发明人： Kouji Iwasaki ,  Yutaka Ikku

IPC分类号： G21K7/00

CPC分类号： G01N1/32 ,  H01J2237/3174

摘要： A thin specimen producing method acquires a work amount in a 1-line scan by an FIB under a predetermined condition, measures a remaining work width of a thin film on an upper surface of a specimen by a microscopic length-measuring function, determines a required number of scan lines of work to reach a predetermined width by calculation, and executes a work to obtain a set thickness. The work amount in a one-line scan by the FIB under the predetermined condition is determined by working the specimen in scans of plural lines, measuring the etched dimension by the microscopic length-measuring function, and calculating an average work amount per one-line scan.

摘要翻译： 薄标本制作方法通过FIB在预定条件下获取1行扫描中的工作量，通过微观长度测量功能测量样品上表面上的薄膜的剩余工作宽度，确定所需的 通过计算达到预定宽度的扫描线的数量，并执行获得设定厚度的工作。 通过FIB在预定条件下的单行扫描中的工作量通过在多行扫描中进行样品的工作，通过微观长度测量功能测量蚀刻尺寸并计算每行的平均工作量来确定 扫描

公开(公告)号：US20070045560A1

公开(公告)日：2007-03-01

申请号：US11509520

申请日：2006-08-24

申请人： Haruo Takahashi ,  Toshiaki Fujii ,  Yutaka Ikku ,  Kouji Iwasaki ,  Yo Yamamoto

发明人： Haruo Takahashi ,  Toshiaki Fujii ,  Yutaka Ikku ,  Kouji Iwasaki ,  Yo Yamamoto

IPC分类号： H01J37/20 ,  G01N1/28

CPC分类号： H01J37/304 ,  G01N1/32 ,  H01J2237/31745 ,  H01J2237/31749

摘要： To include a focused ion beam apparatus fabricating a sliced specimen by processing a specimen as well as observing the sliced specimen, a scanning electron microscope observing the slice specimen, a gas-ion beam irradiation apparatus performing finishing processing by irradiating a gas-ion beam onto a surface of the sliced specimen, a specimen stage on which the sliced specimen is fixed and having at least one or more rotation axis, a specimen posture recognition means recognizing positional relation of the sliced specimen with respect to the specimen stage and a specimen stage control means controlling the specimen stage based on a specimen posture recognized by the posture recognition means and an installation angle of the gas-ion beam irradiation apparatus in order to allow an incident angle of the gas-ion beam with respect to the obverse or the reverse of the sliced specimen to be a desired value.

摘要翻译： 为了包括聚焦离子束装置，通过加工试样和观察切片试样来制造切片样品，观察切片试样的扫描电子显微镜，气相离子束照射装置，通过将气体离子束照射到 切片试样的表面，切片试样固定并具有至少一个以上的旋转轴的试样台，识别切片试样相对于试样台的位置关系的试样姿势识别装置和试样台控制 意味着基于由姿势识别装置识别的样本姿势和气体离子束照射装置的安装角度来控制样本台，以便允许气体离子束相对于正面或反向的入射角 切片样品为期望值。

公开(公告)号：US07973280B2

公开(公告)日：2011-07-05

申请号：US12378138

申请日：2009-02-11

申请人： Haruo Takahashi ,  Yutaka Ikku ,  Yo Yamamoto ,  Kouji Iwasaki

发明人： Haruo Takahashi ,  Yutaka Ikku ,  Yo Yamamoto ,  Kouji Iwasaki

IPC分类号： G01N23/00 ,  H01J27/00

CPC分类号： H01J37/3056 ,  G01N1/286 ,  H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J37/3005 ,  H01J37/3045 ,  H01J2237/31745 ,  H01J2237/31749

摘要： An apparatus is provided that precisely conduct ion beam etching to a sample having the properties of which easily change by electron beam irradiation with no loss of ease of operation and throughput. An apparatus includes an ion beam lens barrel and an electron beam lens barrel, which can observe or measure the conditions of a sample with an electron beam in the process of etching with an ion beam, wherein first, an observation image is obtained that includes the entire process area formed by secondary signals generated by an electron beam, secondly, an irradiation permit area and an irradiation inhibit area are defined in the observation image, and thirdly, electron beam irradiation is restricted only to the irradiation permit area.

摘要翻译： 提供了一种设备，其精确地将离子束蚀刻导入具有易于通过电子束照射而改变的性质的样品，而不会损失操作容易性和生产量。 一种装置包括离子束透镜镜筒和电子束透镜镜筒，其可以在用离子束蚀刻的过程中观察或测量具有电子束的样品的条件，其中首先获得包括 在观察图像中定义由电子束产生的二次信号形成的整个处理区域，其次，照射许可区域和照射禁止区域，第三，电子束照射仅限于照射许可区域。

公开(公告)号：US20090206254A1

公开(公告)日：2009-08-20

申请号：US12378138

申请日：2009-02-11

申请人： Haruo Takahashi ,  Yutaka Ikku ,  Yo Yamamoto ,  Kouji Iwasaki

发明人： Haruo Takahashi ,  Yutaka Ikku ,  Yo Yamamoto ,  Kouji Iwasaki

IPC分类号： G01N23/00 ,  A61N5/00

CPC分类号： H01J37/3056 ,  G01N1/286 ,  H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J37/3005 ,  H01J37/3045 ,  H01J2237/31745 ,  H01J2237/31749

摘要： An apparatus is provided that precisely conduct ion beam etching to a sample having the properties of which easily change by electron beam irradiation with no loss of ease of operation and throughput. An apparatus includes an ion beam lens barrel and an electron beam lens barrel, which can observe or measure the conditions of a sample with an electron beam in the process of etching with an ion beam, wherein first, an observation image is obtained that includes the entire process area formed by secondary signals generated by an electron beam, secondly, an irradiation permit area and an irradiation inhibit area are defined in the observation image, and thirdly, electron beam irradiation is restricted only to the irradiation permit area.

摘要翻译： 提供了一种设备，其精确地将离子束蚀刻导入具有易于通过电子束照射而改变的性质的样品，而不会损失操作容易性和生产量。 一种装置包括离子束透镜镜筒和电子束透镜镜筒，其可以在用离子束蚀刻的过程中观察或测量具有电子束的样品的条件，其中首先获得包括 在观察图像中定义由电子束产生的二次信号形成的整个处理区域，其次，照射许可区域和照射禁止区域，第三，电子束照射仅限于照射许可区域。

公开(公告)号：US07442942B2

公开(公告)日：2008-10-28

申请号：US11509520

申请日：2006-08-24

申请人： Haruo Takahashi ,  Toshiaki Fujii ,  Yutaka Ikku ,  Kouji Iwasaki ,  Yo Yamamoto

发明人： Haruo Takahashi ,  Toshiaki Fujii ,  Yutaka Ikku ,  Kouji Iwasaki ,  Yo Yamamoto

IPC分类号： H01J37/20

CPC分类号： H01J37/304 ,  G01N1/32 ,  H01J2237/31745 ,  H01J2237/31749

摘要： To include a focused ion beam apparatus fabricating a sliced specimen by processing a specimen as well as observing the sliced specimen, a scanning electron microscope observing the slice specimen, a gas-ion beam irradiation apparatus performing finishing processing by irradiating a gas-ion beam onto a surface of the sliced specimen, a specimen stage on which the sliced specimen is fixed and having at least one or more rotation axis, a specimen posture recognition means recognizing positional relation of the sliced specimen with respect to the specimen stage and a specimen stage control means controlling the specimen stage based on a specimen posture recognized by the posture recognition means and an installation angle of the gas-ion beam irradiation apparatus in order to allow an incident angle of the gas-ion beam with respect to the obverse or the reverse of the sliced specimen to be a desired value.

摘要翻译： 为了包括聚焦离子束装置，通过加工试样和观察切片试样来制造切片样品，观察切片试样的扫描电子显微镜，气相离子束照射装置，通过将气体离子束照射到 切片试样的表面，切片试样固定并具有至少一个以上的旋转轴的试样台，识别切片试样相对于试样台的位置关系的试样姿势识别装置和试样台控制 意味着基于由姿势识别装置识别的样本姿势和气体离子束照射装置的安装角度来控制样本台，以便允许气体离子束相对于正面或反向的入射角 切片样品为期望值。

公开(公告)号：US08611493B2

公开(公告)日：2013-12-17

申请号：US13174058

申请日：2011-06-30

申请人： Kiyoshi Hasegawa ,  Yutaka Ikku ,  Hideki Takiguchi

发明人： Kiyoshi Hasegawa ,  Yutaka Ikku ,  Hideki Takiguchi

IPC分类号： G01N23/223

CPC分类号： G01N23/223 ,  G01N2223/076

摘要： The X-ray fluorescence analyzer (100) includes: an enclosure (10); a door (20) for putting the sample into and out of the enclosure; a height measurement mechanism (7) capable of measuring a height at the irradiation point; a moving mechanism control unit (9) for adjusting a distance between the sample and the radiation source as well as the X-ray detector based on the measured height at the irradiation point; a laser unit (7) for irradiating the irradiation point with a visible light laser beam; a laser start control unit (9) for irradiating the visible light laser beam by the laser unit (7) when the door is open state; and a height measurement mechanism start control unit (9) for starting the height measurement mechanism to measure the height at the irradiation point when the door is opened.

摘要翻译： X射线荧光分析仪（100）包括：外壳（10）; 用于将样品放入和离开外壳的门（20）; 能够测量照射点的高度的高度测量机构（7） 移动机构控制单元，用于根据所述照射点处的测量高度来调整所述样本和所述辐射源之间的距离以及所述X射线检测器; 用于用可见光激光束照射所述照射点的激光单元（7）; 激光启动控制单元（9），用于当所述门处于打开状态时，通过所述激光单元（7）照射所述可见光激光束; 以及高度测量机构启动控制单元（9），用于启动高度测量机构以测量门打开时的照射点处的高度。

公开(公告)号：US07627088B2

公开(公告)日：2009-12-01

申请号：US12175743

申请日：2008-07-18

申请人： Yoshiki Matoba ,  Yutaka Ikku

发明人： Yoshiki Matoba ,  Yutaka Ikku

IPC分类号： H01J5/18 ,  G01N23/223

CPC分类号： H01J35/08 ,  H01J35/12 ,  H01J35/18 ,  H01J2235/087 ,  H01J2235/1291

摘要： A vacuumed enclosure has a window formed of an X-ray transmissive material. The vacuumed enclosure encloses an electron beam source for generating an electron beam and a target which, irradiated by the electron beam, generates a primary X-ray. The target is smaller in the outer dimension than the window and located on the center of the window such that it irradiates, through the window, the primary X-ray onto a sample located outside. The vacuumed enclosure further encloses an X-ray detector located such that it can detect a fluorescent X-ray and a scattered X-ray coming from the sample through the window. The X-ray detector generates a signal representative of energy information of the fluorescent X-ray and the scattered X-ray. The vacuumed enclosure further encloses a thermally and electrically conductive metal extending through the target across the widow.

摘要翻译： 抽真空的外壳具有由X射线透射材料形成的窗口。 抽真空的外壳包围用于产生电子束的电子束源和由电子束照射的目标产生主X射线。 目标在外部尺寸上比窗口更小并且位于窗口的中心，使得其通过窗口将初级X射线照射到位于外部的样品上。 抽真空的外壳还包围一个X射线检测器，其位置使得它能够通过窗口检测来自样品的荧光X射线和散射的X射线。 X射线检测器产生表示荧光X射线和散射X射线的能量信息的信号。 被抽真空的外壳进一步封闭一个导电导电的金属，穿过该寡母延伸穿过目标。

公开(公告)号：US07423266B2

公开(公告)日：2008-09-09

申请号：US11360948

申请日：2006-02-23

申请人： Junichi Tashiro ,  Yutaka Ikku ,  Makoto Sato

发明人： Junichi Tashiro ,  Yutaka Ikku ,  Makoto Sato

IPC分类号： G21K7/00 ,  G01N23/00

CPC分类号： G01N23/2251 ,  H01J37/20 ,  H01J37/28 ,  H01J37/304 ,  H01J37/3056 ,  H01J2237/20235 ,  H01J2237/216 ,  H01J2237/221 ,  H01J2237/31745

摘要： In a sample height regulating method, an area including the observation point on the sample is scan-irradiated with a first charged particle beam to obtain a first secondary electron image including the observation point. An area including the observation point on the sample is then scan-irradiated with a second charged particle beam to obtain a second secondary electron image including the observation point. Thereafter, based on magnifications of the first secondary electron image and the second secondary electron image and a distance between the observation point in the first secondary electron image and the observation point in the second secondary electron image, a height of the sample required for focusing the first charged particle beam and the second charged particle beam on the observation point is calculated. A sample stage supporting the sample is then displaced so as to position the sample at the calculated sample height.

摘要翻译： 在样品高度调节方法中，利用第一带电粒子束对包含样品上的观察点的区域进行扫描照射，以获得包括该观察点的第一二次电子图像。 然后利用第二带电粒子束对样品上的观察点进行扫描照射，得到包含该观察点的第二二次电子像。 此后，基于第一二次电子图像和第二二次电子图像的放大率和第一二次电子图像中的观察点与第二二次电子图像中的观察点之间的距离，聚焦所需的样本的高度 计算观测点上的第一带电粒子束和第二带电粒子束。 然后移动支撑样品的样品台，以将样品定位在计算的样品高度。

公开(公告)号：US20070269004A1

公开(公告)日：2007-11-22

申请号：US11799992

申请日：2007-05-03

申请人： Yoshiki Matoba ,  Takayuki Fukai ,  Masanori Takahashi ,  Yutaka Ikku

发明人： Yoshiki Matoba ,  Takayuki Fukai ,  Masanori Takahashi ,  Yutaka Ikku

IPC分类号： G01N23/223 ,  G01T1/36

CPC分类号： G01N23/223 ,  G01N2223/076

摘要： A sample sealing vessel 8 includes a plurality of wall faces comprising a material for transmitting X-ray, an X-ray source 1 is arranged at a wall face 11 to irradiate primary X-ray, a face 12 different from the face irradiated with the primary X-ray is arranged to be opposed to an X-ray detector 10, and the primary X-ray from the X-ray source 1 is arranged to be able to irradiate the wall face 12 of the sample sealing vessel to which the X-ray detector 10 is opposed.

摘要翻译： 样品密封容器8包括多个壁面，其包括用于透射X射线的材料，X射线源1设置在壁面11处以照射主X射线，不同于被照射的面的面12 初级X射线被配置为与X射线检测器10相对，并且来自X射线源1的主X射线被布置成能够照射样品密封容器的壁面12，X射线 射线检测器10相对。

公开(公告)号：US20060138341A1

公开(公告)日：2006-06-29

申请号：US11313326

申请日：2005-12-21

申请人： Junichi Tashiro ,  Yutaka Ikku ,  Makoto Sato

发明人： Junichi Tashiro ,  Yutaka Ikku ,  Makoto Sato

IPC分类号： H01J3/14

CPC分类号： H01J37/222 ,  H01J37/28 ,  H01J37/3056 ,  H01J2237/24592 ,  H01J2237/2487 ,  Y10S707/99943 ,  Y10S707/99945

摘要： By indicating a desired position in any one image plane of a 1st image plane and a 2nd image plane and specifying a corresponding position in the other image plane by using a conversion function for mutually converting an coordinate system of the 1st image plane and that of the 2nd image plane, it is possible to specify a position, in the other image plane, corresponding to the desired position indicated in the any one image plane.

摘要翻译： 通过使用用于相互转换第一图像平面和第二图像平面的坐标系的转换函数来指示第一图像平面和第二图像平面的任何一个图像平面中的期望位置并指定另一图像平面中的对应位置 第二图像平面，可以在另一个图像平面中指定对应于任何一个图像平面中指示的期望位置的位置。