发明授权
- 专利标题: Electroless gold plating solution
- 专利标题(中): 化学镀金液
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申请号: US10732323申请日: 2003-12-10
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公开(公告)号: US07022169B2公开(公告)日: 2006-04-04
- 发明人: Ryota Iwai , Tomoaki Tokuhisa , Masaru Kato
- 申请人: Ryota Iwai , Tomoaki Tokuhisa , Masaru Kato
- 申请人地址: JP Tokyo
- 专利权人: Kanto Kagaku Kabushiki Kaisha
- 当前专利权人: Kanto Kagaku Kabushiki Kaisha
- 当前专利权人地址: JP Tokyo
- 代理机构: Wolf, Greenfield & Sacks, P.C.
- 优先权: JP2002-357720 20021210
- 主分类号: C23C18/42
- IPC分类号: C23C18/42 ; C23C18/44 ; B05D1/18
摘要:
An electroless gold plating solution is provided that contains no cyanide compound as a source of gold and that contains a decomposition inhibitor represented by general formula (1), provided that, in a case in which the solution contains a gold complex of sulfite and the decomposition inhibitor is cytosine, the pH 6.0 or less is excluded. In the formula, R1 to R4 denote hydrogen atom(s), alkyl group(s) having 1 to 10 carbon atom(s), which may have substituent(s), aryl group(s) having 6 to 10 carbon atoms, which may have substituent(s), alkoxy group(s) having 1 to 10 carbon atom(s), which may have substituent(s), amino group(s) (—NH2), hydroxyl group(s) (—OH), ═O, or halogen atom(s), R2 and R3 or R3 and R4 may crosslink with each other and form a saturated or unsaturated ring and the saturated or unsaturated ring may include oxygen, sulfur or nitrogen atom(s), each of the above-mentioned substituents may be a halogen atom or a cyano group, and may be a single bond or a double bond.
公开/授权文献
- US20040118317A1 Electroless gold plating solution 公开/授权日:2004-06-24