发明授权
- 专利标题： Semiconductor wafer susceptor
- 专利标题（中）： 半导体晶圆基座
-
申请号： US10233483申请日： 2002-09-04
-
公开(公告)号： US07022192B2公开(公告)日： 2006-04-04
- 发明人: Anthony Dip , Takanori Saito , Raymond Joe
- 申请人： Anthony Dip , Takanori Saito , Raymond Joe
- 申请人地址： JP Tokyo
- 专利权人： Tokyo Electron Limited
- 当前专利权人： Tokyo Electron Limited
- 当前专利权人地址： JP Tokyo
- 代理机构： Smith, Gambrell & Russell, LLP
- 主分类号： H01L21/00
- IPC分类号： H01L21/00 ; C23C16/00
摘要：
A semiconductor wafer susceptor for batch substrate processing. The susceptor includes a central region in a primary plane and a plurality of flat annular extensions extending below the central region in a secondary plane. The primary and secondary planes are parallel to each other. An edge of the substrate overhangs the central region allowing no contact of the susceptor with the substrate edge.
公开/授权文献
- US20040040510A1 Semiconductor wafer susceptor 公开/授权日：2004-03-04