Invention Grant
- Patent Title: Optical attenuator device, radiation system and lithographic apparatus therewith and device manufacturing method
- Patent Title (中): 光衰减器，辐射系统及其光刻设备及其制造方法
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Application No.: US10748849Application Date: 2003-12-31
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Publication No.: US07030958B2Publication Date: 2006-04-18
- Inventor: Cornelis Petrus Andreas Marie Luijkx , Vadim Yevgenyevich Banine , Hako Botma , Martinus Van Duijnhoven , Markus Franciscus Antonius Eurlings , Heine Melle Mulder , Johannes Hendrik Everhardus Aldegonda Muijderman , Cornelis Jacobus Van Duijn , Jan Jaap Krikke
- Applicant: Cornelis Petrus Andreas Marie Luijkx , Vadim Yevgenyevich Banine , Hako Botma , Martinus Van Duijnhoven , Markus Franciscus Antonius Eurlings , Heine Melle Mulder , Johannes Hendrik Everhardus Aldegonda Muijderman , Cornelis Jacobus Van Duijn , Jan Jaap Krikke
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- Main IPC: G03B27/52
- IPC: G03B27/52
Abstract:
An optical attenuator device operates to remove a part of a beam of radiation having a higher than average intensity using at least one optical attenuator element. The device has application in a radiation system, and/or a lithographic apparatus, in particular a scanning lithographic apparatus, wherein the optical attenuator element(s) are provided in a central part of the beam, for example perpendicularly to a scanning direction.
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