公开(公告)号：US07030958B2

公开(公告)日：2006-04-18

申请号：US10748849

申请日：2003-12-31

申请人： Cornelis Petrus Andreas Marie Luijkx ,  Vadim Yevgenyevich Banine ,  Hako Botma ,  Martinus Van Duijnhoven ,  Markus Franciscus Antonius Eurlings ,  Heine Melle Mulder ,  Johannes Hendrik Everhardus Aldegonda Muijderman ,  Cornelis Jacobus Van Duijn ,  Jan Jaap Krikke

发明人： Cornelis Petrus Andreas Marie Luijkx ,  Vadim Yevgenyevich Banine ,  Hako Botma ,  Martinus Van Duijnhoven ,  Markus Franciscus Antonius Eurlings ,  Heine Melle Mulder ,  Johannes Hendrik Everhardus Aldegonda Muijderman ,  Cornelis Jacobus Van Duijn ,  Jan Jaap Krikke

IPC分类号： G03B27/52

CPC分类号： G03F7/70191 ,  G03F7/70066 ,  G03F7/70116 ,  G03F7/70558

摘要： An optical attenuator device operates to remove a part of a beam of radiation having a higher than average intensity using at least one optical attenuator element. The device has application in a radiation system, and/or a lithographic apparatus, in particular a scanning lithographic apparatus, wherein the optical attenuator element(s) are provided in a central part of the beam, for example perpendicularly to a scanning direction.

摘要翻译： 光衰减器装置使用至少一个光衰减器元件来操作以去除具有高于平均强度的辐射束的一部分。 该装置具有应用于辐射系统和/或光刻设备，特别是扫描光刻设备中，其中光学衰减器元件设置在光束的中心部分，例如垂直于扫描方向。

公开(公告)号：US07508487B2

公开(公告)日：2009-03-24

申请号：US10719065

申请日：2003-11-24

申请人： Johannes Catharinus Hubertus Mulkens ,  Paul Van Der Veen ,  Willem Van Schaik ,  Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Johannes Hubertus Josephina Moors ,  Heine Melle Mulder

发明人： Johannes Catharinus Hubertus Mulkens ,  Paul Van Der Veen ,  Willem Van Schaik ,  Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Johannes Hubertus Josephina Moors ,  Heine Melle Mulder

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03B27/54

CPC分类号： G03F7/70558 ,  G03F7/70883 ,  G03F7/70933 ,  G03F7/70941

摘要： In a lithographic projection system, the radiation energy delivered to the substrate needs to be accurately controlled. Attenuation by injecting an absorbent gas into a volume through which the radiation passes is a convenient way to control the energy. Additionally, the interaction between gasses and the radiation may be used to measure the energy of the radiation with minimal disruption to the radiation.

摘要翻译： 在光刻投影系统中，需要准确地控制传送到基板的辐射能量。 通过将吸收气体注入到辐射通过的体积中的衰减是控制能量的便利方式。 此外，气体和辐射之间的相互作用可用于以最小的辐射破坏来测量辐射的能量。

公开(公告)号：US09726989B2

公开(公告)日：2017-08-08

申请号：US13643265

申请日：2011-02-22

申请人： Wouter Anthon Soer ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Andrei Mikhailovich Yakunin ,  Martin Jacobus Johan Jak

发明人： Wouter Anthon Soer ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Andrei Mikhailovich Yakunin ,  Martin Jacobus Johan Jak

IPC分类号： G02B5/20 ,  G03F7/20

CPC分类号： G03F7/70891 ,  G02B5/208 ,  G03F7/70191 ,  G03F7/70575

摘要： A spectral purity filter includes a body of material, through which a plurality of apertures extend. The apertures are arranged to suppress radiation having a first wavelength and to allow at least a portion of radiation having a second wavelength to be transmitted through the apertures. The second wavelength of radiation is shorter than the first wavelength of radiation. The body of material is formed from a material having a bulk reflectance of substantially greater than or equal to 70% at the first wavelength of radiation. The material has a melting point above 1000° C.

公开(公告)号：US09488922B2

公开(公告)日：2016-11-08

申请号：US13883083

申请日：2011-10-06

申请人： Yuri Vainer ,  Vadim Yevgenyevich Banine ,  Luigi Scaccabarozzi ,  Arie Jeffrey Den Boef

发明人： Yuri Vainer ,  Vadim Yevgenyevich Banine ,  Luigi Scaccabarozzi ,  Arie Jeffrey Den Boef

IPC分类号： G01J1/42 ,  G03F7/20 ,  G01N21/94 ,  G01N21/956 ,  G03F1/84 ,  G03F1/24

CPC分类号： G03F7/7085 ,  G01N21/94 ,  G01N21/956 ,  G01N21/95623 ,  G01N2021/95676 ,  G03F1/24 ,  G03F1/84 ,  G03F7/70916

摘要： An EUV lithography reticle is inspected to detect contaminant particles. The inspection apparatus comprises illumination optics with primary radiation. An imaging optical system with plural branches is arranged to form and detect a plurality of images, each branch having an image sensor and forming its image with a different portion of radiation received from the illuminated article. A processor combines information from the detected images to report on the presence and location of contaminant particles. In one or more branches the primary radiation is filtered out, so that the detected image is formed using only secondary radiation emitted by contaminant material in response to the primary radiation. In a dark field imaging branch using the scattered primary radiation, a spatial filter blocks spatial frequency components associated with periodic features of the article under inspection, to allow detection of particles which cannot be detected by secondary radiation.

摘要翻译： 检查EUV光刻掩模版以检测污染物颗粒。 检查装置包括具有初级辐射的照明光学器件。 布置具有多个分支的成像光学系统以形成和检测多个图像，每个分支具有图像传感器并且形成具有从照明物品接收的辐射的不同部分的图像。 处理器结合来自检测图像的信息，报告污染物颗粒的存在和位置。 在一个或多个分支中，主辐射被滤出，使得仅使用由污染物材料响应于初级辐射发射的二次辐射形成检测到的图像。 在使用散射的初级辐射的暗场成像分支中，空间滤波器阻挡与被检查物品的周期特征相关联的空间频率分量，以允许检测不能被二次辐射检测的颗粒。

公开(公告)号：US09372399B2

公开(公告)日：2016-06-21

申请号：US13812459

申请日：2011-07-21

申请人： Martinus Bernardus Van Der Mark ,  Vadim Yevgenyevich Banine ,  Andre Bernardus Jeunink ,  Johan Frederik Dijksman ,  Sander Frederik Wuister ,  Emiel Andreas Godefridus Peeters ,  Johan Hendrik Klootwijk ,  Roelof Koole ,  Christianus Martinus Van Heesch ,  Ruediger Guenter Mauczok ,  Jacobus Bernardus Giesbers

发明人： Martinus Bernardus Van Der Mark ,  Vadim Yevgenyevich Banine ,  Andre Bernardus Jeunink ,  Johan Frederik Dijksman ,  Sander Frederik Wuister ,  Emiel Andreas Godefridus Peeters ,  Johan Hendrik Klootwijk ,  Roelof Koole ,  Christianus Martinus Van Heesch ,  Ruediger Guenter Mauczok ,  Jacobus Bernardus Giesbers

IPC分类号： G03F7/00 ,  B82Y10/00 ,  B82Y40/00

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

摘要： An imprint lithography method is disclosed for reducing a difference between an intended topography and an actual topography arising from a part of a patterned layer of fixed imprintable medium. The method involves imprinting an imprint lithography template into a layer of flowable imprintable medium to form a patterned layer in the imprintable medium, and fixing the imprintable medium to form a patterned layer of fixed imprintable medium. Local excitation is applied to the part of the patterned layer to adjust a chemical reaction in the part of the patterned layer to reduce the difference between the intended topography and the actual topography arising from the part of the fixed patterned layer of imprintable medium when this is subsequently used as a resist for patterning the substrate. An imprint medium suitable for imprint lithography with the method is also disclosed.

摘要翻译： 公开了一种压印光刻方法，用于减少由固定的可打印介质的图案层的一部分产生的预期形貌和实际形貌之间的差异。 该方法包括将压印光刻模板压印到可流动的可压印介质层中以在可压印介质中形成图案化层，并固定可压印介质以形成固定可压印介质的图案化层。 局部激发被施加到图案化层的部分以调整图案化层的部分中的化学反应，以减少所期望的形貌与由可压印介质的固定图案化层的部分产生的实际形貌之间的差异，当这是 随后用作图案化基板的抗蚀剂。 还公开了适用于该方法的压印光刻的压印介质。

公开(公告)号：US09195144B2

公开(公告)日：2015-11-24

申请号：US13059057

申请日：2009-07-09

申请人： Martin Jacobus Johan Jak ,  Vadim Yevgenyevich Banine ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer ,  Andrei Mikhailovich Yakunin

发明人： Martin Jacobus Johan Jak ,  Vadim Yevgenyevich Banine ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer ,  Andrei Mikhailovich Yakunin

IPC分类号： G03B27/72 ,  G03F7/20 ,  G21K1/10

CPC分类号： G03F7/702 ,  G03F7/70191 ,  G03F7/70575 ,  G21K1/10

摘要： A spectral purity filter is configured to allow transmission therethrough of extreme ultraviolet (EUV) radiation and to refract or reflect non-EUV secondary radiation. The spectral purity filter may be part of a source module and/or a lithographic apparatus.

摘要翻译： 光谱纯度滤光器被配置为允许透射通过其中的极紫外（EUV）辐射并折射或反射非EUV次级辐射。 光谱纯度滤光片可以是源模块和/或光刻设备的一部分。

公开(公告)号：US09110389B2

公开(公告)日：2015-08-18

申请号：US13241837

申请日：2011-09-23

申请人： Joannes Theodoor De Smit ,  Vadim Yevgenyevich Banine ,  Theodorus Hubertus Josephus Bisschops ,  Marcel Mathijs Theodore Marie Dierichs ,  Theodorus Marinus Modderman

发明人： Joannes Theodoor De Smit ,  Vadim Yevgenyevich Banine ,  Theodorus Hubertus Josephus Bisschops ,  Marcel Mathijs Theodore Marie Dierichs ,  Theodorus Marinus Modderman

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/708 ,  G03F7/70858

摘要： A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.

摘要翻译： 光刻设备和设备制造方法利用被限制在投影系统和基板之间的储存器中的液体。 检测和/或去除从溶解的大气中的液体中形成的液体或从暴露于液体的装置元件排出的气泡，使得它们不会干扰曝光并导致在基板上的印刷缺陷。 可以通过测量液体中超声波衰减的频率依赖性来进行检测，并且可以通过使液体脱气和加压，使用低表面张力的液体将液体与大气隔离，从而提供连续的液体流动 成像场和/或相移超声波驻波节点图案。

公开(公告)号：US09097982B2

公开(公告)日：2015-08-04

申请号：US12994930

申请日：2009-05-05

申请人： Vadim Yevgenyevich Banine ,  Wilhelmus Petrus De Boeij ,  Antonius Johannes Josephus Van Dijsseldonk ,  Erik Roelof Loopstra ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels

发明人： Vadim Yevgenyevich Banine ,  Wilhelmus Petrus De Boeij ,  Antonius Johannes Josephus Van Dijsseldonk ,  Erik Roelof Loopstra ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels

IPC分类号： G03F7/20

CPC分类号： G03F7/70191 ,  G03F7/70116 ,  G03F7/70575

摘要： A radiation system is configured to generate a radiation beam. The radiation system comprising a chamber that includes a radiation source configured to generate radiation, a radiation beam emission aperture, and a radiation collector configured to collect radiation generated by the source, and to transmit the collected radiation to the radiation beam emission aperture. The radiation collector includes a spectral purity filter configured to enhance a spectral purity of the radiation to be emitted via the aperture.

摘要翻译： 辐射系统被配置为产生辐射束。 所述辐射系统包括腔室，所述室包括被配置为产生辐射的辐射源，辐射束发射孔和被配置为收集由所述源产生的辐射的辐射收集器，并且将所收集的辐射传输到所述辐射束发射孔。 辐射收集器包括光谱纯度滤光器，其配置成增强经由孔径发射的辐射的光谱纯度。

公开(公告)号：US09091944B2

公开(公告)日：2015-07-28

申请号：US13497741

申请日：2010-09-24

申请人： Erik Roelof Loopstra ,  Vadim Yevgenyevich Banine ,  Gerardus Hubertus Petrus Maria Swinkels ,  Sven Pekelder ,  Dzmitry Labetski ,  Uwe Bruno Heini Stamm ,  William N. Partlo

发明人： Erik Roelof Loopstra ,  Vadim Yevgenyevich Banine ,  Gerardus Hubertus Petrus Maria Swinkels ,  Sven Pekelder ,  Dzmitry Labetski ,  Uwe Bruno Heini Stamm ,  William N. Partlo

IPC分类号： G03B27/54 ,  G03F7/20 ,  H05G2/00

CPC分类号： G03F7/70933 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70808 ,  G03F7/70908 ,  G03F7/70916 ,  G03F7/70925 ,  H05G2/003 ,  H05G2/005

摘要： An EUV lithographic apparatus includes a source collector apparatus in which the extreme ultraviolet radiation is generated by exciting a fuel to provide a plasma emitting the radiation. The source collector apparatus includes a chamber in fluid communication with a guide way external to the chamber. A pump for circulating buffer gas is part of the guide way, and provides a closed loop buffer gas flow. The gas flowing through the guide way traverses a gas decomposer wherein a compound of fuel material and buffer gas material is decomposed, so that decomposed buffer gas material can be fed back into the closed loop flow path.

摘要翻译： EUV光刻设备包括源极收集器装置，其中通过激发燃料产生极紫外辐射以提供发射辐射的等离子体。 源极收集器装置包括与腔室外部的引导方式流体连通的腔室。 用于循环缓冲气体的泵是引导方式的一部分，并提供闭环缓冲气体流。 流过引导方式的气体穿过气体分解器，其中燃料和缓冲气体材料的化合物被分解，使得分解的缓冲气体材料可以反馈回闭环流动路径。

公开(公告)号：US20140160455A1

公开(公告)日：2014-06-12

申请号：US14181076

申请日：2014-02-14

申请人： Andrei Mikhailovich YAKUNIN ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Harmen Klaas Ven Der Schoot ,  Lucas Henricus Johannes Stevens ,  Maarten Van Kampen

发明人： Andrei Mikhailovich YAKUNIN ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Harmen Klaas Ven Der Schoot ,  Lucas Henricus Johannes Stevens ,  Maarten Van Kampen

IPC分类号： G03F7/20

CPC分类号： G03F1/64 ,  B82Y10/00 ,  B82Y40/00 ,  C01B32/20 ,  G02B5/0816 ,  G02B5/0891 ,  G02B5/204 ,  G02B5/208 ,  G02B27/0006 ,  G03B27/54 ,  G03F1/24 ,  G03F1/62 ,  G03F7/70058 ,  G03F7/702 ,  G03F7/70916 ,  G03F7/70958 ,  G03F7/70983 ,  G21K1/062 ,  G21K2201/061 ,  H01B1/04 ,  H01B1/24

摘要： A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.

摘要翻译： 包括石墨烯的防护薄膜组件被构造并布置成用于EUV掩模版。 多层反射镜包括石墨烯作为最外层。